Electronic damper circuit for MEMS sensors and resonators

• US 8,875,578 B2
• Filed: 10/26/2011
• Issued: 11/04/2014
• Est. Priority Date: 10/26/2011
• Status: Active Grant

• Current Assignee: Silicon Laboratories Incorporated
• Original Assignee: Silicon Laboratories Incorporated
• Inventors: Smith, Eric B.
• Primary Examiner(s): KWOK, HELEN C
• Application Number:
  US13/281,928
• Publication Number:
  US 20130104656A1
• Time in Patent Office: 1,105 Days
• Field of Search: 735/143.2, 735/143.8, 735/143.6, 735/141.7, 735/141.8, 735/041.2, 735/041.4, 735/040.4
• US Class Current: 73/514.18
• CPC Class Codes: G01C 19/5726 Signal processing
• CPC Class Codes: G01P 1/003 used for damping
• CPC Class Codes: G01P 15/097 by vibratory elements
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 2015/0882 for providing damping of vibrations

Abstract

An apparatus includes a microelectromechanical system (MEMS) device including a mass anchored to a substrate. The MEMS device is configured to generate an output signal indicative of motion of the mass with respect to the substrate. The MEMS device includes a feedback module configured to provide a control signal to the MEMS device. The control signal is based on the output signal. The MEMS device is configured to apply a damping force to the mass in response to the control signal.

Claims

1. An apparatus comprising:

a microelectromechanical system (MEMS) device comprising a mass suspended from a substrate, the MEMS device being configured to generate an output signal indicative of motion of the mass with respect to the substrate; and

a feedback module configured to provide a control signal to the MEMS device, the control signal being based on the output signal, the MEMS device being configured to apply a damping force to the mass in response to the control signal, the control signal being proportional to a velocity of the mass.

2. The apparatus, as recited in claim 1, wherein the output signal is indicative of a displacement of the mass with respect to the substrate and the control signal is generated based on a derivative of the output signal with respect to time.

3. The apparatus, as recited in claim 1, wherein the output signal is indicative of a velocity of the mass with respect to the substrate and the control signal is proportional to the output signal.

4. The apparatus, as recited in claim 1, wherein in response to the damping force, the mass continues to move in response to an inertial force causing the motion and an amplitude of mass displacement gradually decreases.

5. The apparatus, as recited in claim 1, wherein the MEMS device comprises a capacitive actuator configured to apply a force to the mass in response to the control signal.

6. The apparatus, as recited in claim 1, wherein the MEMS device comprises:

a first set of electrodes configured to sense the displacement; and

a second set of electrodes configured to apply the damping force to the mass.

7. The apparatus, as recited in claim 6, wherein the second set of electrodes is further configured to apply an excitation signal to the MEMS device.

8. The apparatus, as recited in claim 1, wherein the MEMS device is sealed in a low pressure gas environment.

9. The apparatus, as recited in claim 1, wherein the feedback module comprises:

a differentiator module configured to generate a signal indicating an approximate derivative of a displacement signal with respect to time, the displacement signal being based on the output signal.

10. The apparatus, as recited in claim 1, wherein the MEMS device comprises:

a first electrode and a second electrode configured to apply a sensing signal to the MEMS device; and

a third electrode and a fourth electrode configured to receive the control signal and apply the damping force to the mass.

11. The apparatus, as recited in claim 1, further comprising:

a demodulator module configured to generate a baseband version of the output signal based on a version of a sensing signal provided to the MEMS device.

21. The apparatus, as recited in claim 1, wherein the MEMS device further comprises electrodes configured to apply the damping force to the mass separately from sensing displacement of the mass and separately from applying any excitation force to the mass.

12. A method comprising:

damping a mass suspended from a substrate of a microelectromechanical system (MEMS) device, the damping being based on sensed motion of the mass with respect to a substrate of the MEMS device, the damping comprising applying a damping force to the mass of the MEMS device proportional to a velocity of the MEMS device.

13. The method, as recited in claim 12, wherein the damping comprises:

generating a feedback signal based on the sensed motion; and

applying the damping force to the mass of the MEMS device in response to the feedback signal.

14. The method, as recited in claim 12, wherein the damping is substantially greater than a damping force due to any gas in a cavity surrounding the mass.

15. The method, as recited in claim 12, wherein the sensed motion is sensed displacements of the mass with respect to the substrate and the damping comprises:

generating a derivative with respect to time of the sensed displacements,

wherein the damping force is proportional to the derivative.

16. The method, as recited in claim 12, wherein the sensed motion is a velocity of the mass with respect to the substrate.

17. The method, as recited in claim 12, further comprising:

sensing displacements of the mass with respect to the substrate and generating a signal indicative thereof; and

demodulating the signal from a sensing frequency to a baseband signal and damping the mass is based on the baseband signal.

18. The method, as recited in claim 12, wherein the damping reduces displacements of the mass and the displacements of the mass continue in response to the damping signal, the amplitude of mass displacements gradually decreasing to zero.

19. An apparatus comprising:

a microelectromechanical system (MEMS) device comprising a mass suspended from a substrate, the MEMS device being configured to sense motion of the mass with respect to a substrate of the MEMS device and configured to apply a damping force to the mass in response to a control signal, the damping force being determined according to a velocity of the mass.

20. The apparatus, as recited in claim 19, further comprising:

a feedback module configured to generate the control signal based on an indicator of the sensed motion.