Technique for forming a MEMS device using island structures
First Claim
1. A method of manufacturing an integrated circuit including a MEMS device comprising:
- forming a structural layer above a substrate including at least one semiconductor device;
patterning the structural layer to form a first portion of the structural layer;
forming an attachment to the first portion of the structural layer, the attachment comprising a portion of a layer having a thickness substantially greater than a thickness of the structural layer, the attachment being conjoined with the first portion of the structural layer; and
releasing the first portion of the structural layer and the attachment from the substrate.
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Accused Products
Abstract
A method of manufacturing an integrated circuit including a MEMS device includes forming a structural layer above a substrate including at least one semiconductor device. The method includes forming an attachment to a first portion of the structural layer, the attachment having a thickness substantially greater than a thickness of the structural layer. In at least one embodiment of the method, the attachment is conjoined with the first portion of the structural layer and the first portion of the structural layer and the attachment are operative to mechanically move in unison. In at least one embodiment of the method, forming the attachment includes forming a patterned filler layer of a first material above the structural layer and forming a patterned conformal layer of a second material on the patterned filler layer. The filler layer has a thickness substantially greater than the thickness of the structural layer.
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Citations
22 Claims
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1. A method of manufacturing an integrated circuit including a MEMS device comprising:
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forming a structural layer above a substrate including at least one semiconductor device; patterning the structural layer to form a first portion of the structural layer; forming an attachment to the first portion of the structural layer, the attachment comprising a portion of a layer having a thickness substantially greater than a thickness of the structural layer, the attachment being conjoined with the first portion of the structural layer; and releasing the first portion of the structural layer and the attachment from the substrate. - View Dependent Claims (2, 3, 4, 5, 13, 14, 15, 16, 17, 19, 20)
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6. A method of manufacturing an integrated circuit including a MEMS device comprising:
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forming a structural layer above a substrate including at least one semiconductor device; and forming an attachment to a first portion of the structural layer, the attachment having a thickness substantially greater than a thickness of the structural layer, wherein the attachment comprises a patterned filler layer and a patterned conformal layer coating the patterned filler layer and forming the attachment comprises; forming the patterned filler layer of a first material above the structural layer, the patterned filler layer having a thickness substantially greater than the thickness of the structural layer; and forming the patterned conformal layer of a second material on the patterned filler layer; forming a sacrificial layer on the substrate, above the at least one semiconductor device and below the structural layer; and removing portions of the sacrificial layer to release the first portion of the structural layer and the attachment. - View Dependent Claims (7, 8, 9, 10, 11, 12, 18, 21, 22)
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Specification