Inductively-coupled plasma device

• US 8,878,434 B2
• Filed: 07/02/2012
• Issued: 11/04/2014
• Est. Priority Date: 10/27/2009
• Status: Active Grant

• Current Assignee: Covidien LP (Medtronic Plc)
• Original Assignee: Covidien LP (Medtronic Plc)
• Inventors: Gilbert, James A.
• Primary Examiner(s): Vu, Jimmy
• Assistant Examiner(s): YANG, AMY X
• Application Number:
  US13/539,829
• Publication Number:
  US 20120268010A1
• Time in Patent Office: 855 Days
• Field of Search: 315/111.21, 315/111.41, 315/111.51, 156/345.48, 118/723.I
• US Class Current: 315/111.21
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H05H 1/245 the plasma being activated using internal electrodes
• CPC Class Codes: H05H 1/2465 the plasma being activated by inductive coupling, e.g. using coiled electrodes
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: H05H 1/4652 using inductive coupling means, e.g. coils
• CPC Class Codes: H05H 1/4697 using glow discharges

Abstract

A plasma device configured to receive ionizable media is disclosed. The plasma device includes a first pair of dielectric substrates each having an inner surface and an outer surface. The first pair of dielectric substrates is disposed in spaced, parallel relation relative to one another with the inner surfaces thereof facing one another. The device also includes a first pair of spiral coils each disposed on the inner surface of the dielectric substrates. The first pair of spiral coils is configured to couple to a power source and configured to inductively couple to an ionizable media passed therebetween to ignite the ionizable media to form a plasma effluent.

Claims

1. A plasma device configured to receive ionizable media, comprising:

a first pair of spiral coils disposed in spaced, parallel relation relative to one another and defining a first opening therethrough; and

a first pair of dielectric substrates having the first pair of spiral coils disposed thereon, each of the first pair of dielectric substrates including a second opening extending through each of the first pair of dielectric substrates, wherein the first pair of spiral coils is configured to couple to a power source and configured to inductively couple to an ionizable media passed through the first openings and the second openings to ignite the ionizable media to form a plasma effluent.

2. The plasma device according to claim 1, further comprising:

a plurality of offsets disposed between the first pair of dielectric substrates.

3. The plasma device according to claim 1, wherein each of the dielectric substrates of the first pair of dielectric substrates is formed from a thermosetting dielectric polymer.

4. The plasma device according to claim 1, wherein each of the spiral coils of the first pair of spiral coils is traced on the corresponding dielectric substrate.

5. The plasma device according to claim 1, further comprising:

a second pair of spiral coils disposed in spaced, parallel relation relative to one another and transverse relation relative to the first pair of spiral coils, wherein the second pair of spiral coils is configured to couple to the power source and configured to inductively couple to the ionizable media passed therebetween to ignite the ionizable media to form the plasma effluent.

6. The plasma device according to claim 5, wherein each of the second pair of spiral coils is formed from a wire to form a disk-like structure.

7. The plasma device according to claim 5, wherein each of the second pair of spiral coils is formed from a wire to form a ring-like structure.

8. The plasma device according to claim 5, further comprising a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates comprises one of the second pair of spiral coils.

9. A plasma device configured to receive ionizable media, comprising:

a first pair of spiral coils disposed in spaced, parallel relation relative to one another and defining a first opening therethrough; and

a second pair of spiral coils disposed in spaced, parallel relation relative to one another and transverse relation relative to the first pair of spiral coils, wherein the first and second pairs of spiral coils are configured to couple to a power source and configured to inductively couple to an ionizable media passed through the first opening to ignite the ionizable media to form a plasma effluent.

10. The plasma device according to claim 9, wherein each of the second pair of spiral coils is formed from a wire to form a disk-like structure.

11. The plasma device according to claim 9, wherein each of the second pair of spiral coils is formed from a wire to form a ring-like structure.

12. The plasma device according to claim 9, further comprising a first pair of dielectric substrates each of which comprises one of the first pair of spiral coils.

13. The plasma device according to claim 12, wherein the first pair of dielectric substrates defines a second opening that is substantially aligned with the first opening.

14. The plasma device according to claim 12, further comprising:

a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates comprises one of the second pair of spiral coils.

15. The plasma device according to claim 14, wherein each of the dielectric substrates of the first and second pairs of dielectric substrates is formed from a thermosetting dielectric polymer.

16. A plasma system, comprising:

a plasma device including;

a first pair of spiral coils disposed in spaced, parallel relation relative to one another and defining a first opening therethrough;

a first pair of dielectric substrates each of which includes one of the spiral coils of the first pair of spiral coils and defines a second opening that is substantially aligned with the first opening;

a second pair of spiral coils disposed in spaced, parallel relation relative to one another and transverse relation relative to the first pair of spiral coils; and

a second pair of dielectric substrates coupled to the first pair of dielectric substrates and disposed transversely relative thereto, each of the second pair of dielectric substrates includes one of the spiral coils of the second pair of spiral coils;

an ionizable media source coupled to the plasma device and configured to supply ionizable media between the first pair of spiral coils and the second pair of spiral coils; and

a power source coupled to the first pair of spiral coils and the second pair of spiral coils, wherein the first pair of spiral coils and the second pair of spiral coils are configured to inductively couple to an ionizable media passed through the first openings to ignite the ionizable media to form a plasma effluent.