Charged particle beam writing apparatus

• US 8,884,254 B2
• Filed: 12/17/2013
• Issued: 11/11/2014
• Est. Priority Date: 12/26/2012
• Status: Active Grant

• Current Assignee: NuFlare Technology, Inc. (Toshiba Corporation)
• Original Assignee: NuFlare Technology, Inc. (Toshiba Corporation)
• Inventors: Touya, Takanao, Ogasawara, Munehiro
• Primary Examiner(s): Vanore, David A
• Application Number:
  US14/108,936
• Publication Number:
  US 20140175303A1
• Time in Patent Office: 329 Days
• US Class Current: 250/492.22
• CPC Class Codes: H01J 2237/1508 Combined electrostatic-electromagnetic means
• CPC Class Codes: H01J 37/141 Electromagnetic lenses
• CPC Class Codes: H01J 37/145 Combinations of electrostatic and magnetic lenses
• CPC Class Codes: H01J 37/1474 Scanning means
• CPC Class Codes: H01J 37/3026 Patterning strategy
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.

Claims

1. A multi charged particle beam writing apparatus comprising:

a stage configured to mount a target object thereon;

an emission unit configured to emit a charged particle beam;

an aperture member, in which a plurality of openings are formed, configured to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;

a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite; and

three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of the plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object,

wherein the multibeam is deflected by a two-state deflection of main and sub stages, and two of the three or more electrostatic lenses serve as two main deflectors being the deflectors for performing a main stage deflection of the two-stage deflection,

the apparatus further comprising a sub deflector for performing a sub stage deflection of the two-stage deflection, the sub deflector being provided to be arranged between the two main deflectors.

2. The apparatus according to claim 1, wherein one or more of the three or more electrostatic lenses, which include the one or more electrostatic lenses also serving deflectors, serve as stigmators.

3. The apparatus according to claim 1, wherein adjustment of the three or more electrostatic lenses is performed such that the multibeam is dynamically focused in accordance with a surface height of the target object, magnification of a beam image of the multibeam is maintained to be constant, and the beam image is not rotated at a same time, by using the three or more electrostatic lenses.

4. The apparatus according to claim 3, wherein the one or more of the three or more electrostatic lens, also serving as the deflectors, is separated into a plurality of electrodes along a circumferential direction and has a sufficient length to deflect the multibeam to the target object, and voltage corresponding to an amount of focus correction for dynamically focusing by the one or more of the three of more electrostatic lenses is equally applied to the plurality of electrodes.

5. The apparatus according to claim 1, wherein two of the three or more electrostatic lenses are respectively composed of ring-shaped three-stage electrodes.

6. The apparatus according to claim 1, wherein one of the three or more electrostatic lenses is composed of a ring-shaped electrode being a first stage, a plurality of electrodes separated along a circumferential direction being a second stage, and a ring-shaped electrode being a third stage.

7. The apparatus according to claim 6, wherein the one of the three or more electrostatic lenses also serves as one of the deflectors.

8. The apparatus according to claim 7, wherein the one of the three or more electrostatic lenses also serves as a stigmator.

9. The apparatus according to claim 1, wherein two of the three or more electrostatic lenses are arranged in one magnetic field of the plurality of electromagnetic lenses, and one of the three or more electrostatic lenses and the sub deflector are arranged in another magnetic field of the plurality of electromagnetic lenses.