Method of making a non-volatile memory (NVM) cell structure
First Claim
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1. A non-volatile memory device comprising:
- a substrate;
a charge storage layer comprising;
a bottom layer of oxide;
a layer of discrete charge storage elements on the bottom layer of oxide;
a top layer of oxide on the discrete charge storage elements; and
a control gate on the top layer of oxide, wherein a surface of the top layer of oxide facing a surface of the control gate is substantially planar, and wherein a radius of curvature of the top layer of oxide over a majority of the discrete charge storage elements is at least twice a sum of a radius of the discrete charge storage element plus a thickness of the top layer of oxide.
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Abstract
A non-volatile memory device includes a substrate and a charge storage layer. The charge storage layer comprises a bottom layer of oxide, a layer of discrete charge storage elements on the bottom layer of oxide, and a top layer of oxide on the charge storage elements. A control gate is on the top layer of oxide. A surface of the top layer of oxide facing a surface of the control gate is substantially planar.
11 Citations
17 Claims
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1. A non-volatile memory device comprising:
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a substrate; a charge storage layer comprising; a bottom layer of oxide; a layer of discrete charge storage elements on the bottom layer of oxide; a top layer of oxide on the discrete charge storage elements; and a control gate on the top layer of oxide, wherein a surface of the top layer of oxide facing a surface of the control gate is substantially planar, and wherein a radius of curvature of the top layer of oxide over a majority of the discrete charge storage elements is at least twice a sum of a radius of the discrete charge storage element plus a thickness of the top layer of oxide. - View Dependent Claims (2, 3, 4)
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5. A method of making a non-volatile memory device comprising:
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forming a first electrically insulating material on a substrate; forming discrete charge storage elements on the first electrically insulating material; and depositing a second electrically insulating material over the discrete charge storage elements, wherein a top surface of the second electrically insulating material is substantially planar, wherein a radius of curvature of the second electrically insulating material over one of the discrete charge storage elements is at least twice a sum of a radius of the one discrete charge storage element plus a thickness of the second electrically insulating material. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12)
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13. A method comprising:
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forming a first oxide layer on a substrate; forming discrete charge storage elements on the first oxide layer; and forming a second oxide layer that is planar on the discrete charge storage elements having a thickness that is less than a diameter of the charge storage elements, wherein a radius of curvature of the second oxide layer over the discrete charge storage elements is at least twice a sum of a radius of the discrete charge storage elements plus a thickness of the second oxide layer. - View Dependent Claims (14, 15, 16, 17)
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Specification