×

Inductor device and fabrication method

  • US 8,884,399 B2
  • Filed: 11/30/2012
  • Issued: 11/11/2014
  • Est. Priority Date: 06/06/2012
  • Status: Active Grant
First Claim
Patent Images

1. An inductor device comprising:

  • a semiconductor substrate;

    a first planar spiral wiring disposed over the semiconductor substrate;

    a second planar spiral wiring disposed over the first planar spiral wiring; and

    a third planar spiral wiring disposed over the second planar spiral wiring,wherein each planar layer of the first, the second, and the third planar spiral wirings includes an outer spiral metal wiring and, an inner spiral metal wiring including at least two isolated sub-metal-lines each connecting to the outer spiral metal wiring such that the outer spiral metal wiring and the inner spiral metal wiring are connected in series in each corresponding planar layer, and the outer spiral metal wiring surrounds the inner spiral metal wiring in each corresponding planar layer, andwherein one sub-metal-line of the at least two isolated sub-metal-lines in each planar layer of the first, the second, and the third planar spiral wirings is connected to one another, and the outer spiral metal wiring in the first planar spiral wiring is connected to the outer spiral metal wiring in the third planar spiral wiring such that the first and the third planar spiral wirings are configured in parallel and the second planar spiral wiring is configured in series with the first and the third planar spiral wirings configured in parallel.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×