Liquid crystal display device and method for fabricating the same
First Claim
1. A method for fabricating a liquid crystal display device comprising:
- forming a gate line, a gate electrode and a gate pad lower electrode on a substrate using a first mask;
forming a gate insulating layer on an entire surface of the substrate including the gate line, the gate electrode and the gate pad lower electrode;
forming a semiconductor layer on the gate insulating layer over the gate electrode using a second mask;
forming a pixel electrode on the gate insulating layer using a third mask;
forming a data line and a data pad lower electrode on the gate insulating layer, and a source electrode and a drain electrode separated from the source electrode and connected directly to the pixel electrode on the semiconductor layer using a fourth mask, thereby forming a thin film transistor including the gate electrode and the source and drain electrodes;
forming an insulating film on an entire surface of the substrate including the data line and the source and drain electrodes;
forming an organic material on an entire surface of the insulating film;
exposing and developing the organic material to form an organic film pattern by using a half tone mask as a fifth mask, wherein the half tone mask includes a transmitting region corresponding to the gate and data pad lower electrodes, a blocking region corresponding to the data line and the thin film transistor and a semi-transmitting region corresponding to remaining areas, wherein the organic film pattern exposes the insulating film over the gate and data pad lower electrodes;
removing the exposed insulating film to form contact holes on the gate and data pad lower electrodes;
ashing the organic film pattern to form an organic material layer over the thin film transistor and the data line; and
forming a common electrode of slit shapes on the substrate to overlap with the pixel electrode using a sixth mask such that the insulating film is interposed between the common electrode and the pixel electrode,wherein the organic material layer is formed of a light shielding material.
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Accused Products
Abstract
Disclosed are a liquid crystal display device which reduces the number of masks and improves an aperture ratio, and a method for fabricating the same. The liquid crystal display device includes gate and data lines perpendicularly intersecting on a substrate having pixel and pad parts; a thin film transistor on the substrate at the intersection of the gate and data lines; a pixel electrode on the substrate at the pixel part and connected directly to a drain electrode of the thin film transistor; an insulating film on the overall surface of the substrate including the pixel electrode and the thin film transistor; an organic film on the insulating film over the thin film transistor and the data line; and a common electrode of slit shapes overlapping the pixel electrode such that the insulating film is interposed between the common electrode and the pixel electrode.
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Citations
4 Claims
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1. A method for fabricating a liquid crystal display device comprising:
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forming a gate line, a gate electrode and a gate pad lower electrode on a substrate using a first mask; forming a gate insulating layer on an entire surface of the substrate including the gate line, the gate electrode and the gate pad lower electrode; forming a semiconductor layer on the gate insulating layer over the gate electrode using a second mask; forming a pixel electrode on the gate insulating layer using a third mask; forming a data line and a data pad lower electrode on the gate insulating layer, and a source electrode and a drain electrode separated from the source electrode and connected directly to the pixel electrode on the semiconductor layer using a fourth mask, thereby forming a thin film transistor including the gate electrode and the source and drain electrodes; forming an insulating film on an entire surface of the substrate including the data line and the source and drain electrodes; forming an organic material on an entire surface of the insulating film; exposing and developing the organic material to form an organic film pattern by using a half tone mask as a fifth mask, wherein the half tone mask includes a transmitting region corresponding to the gate and data pad lower electrodes, a blocking region corresponding to the data line and the thin film transistor and a semi-transmitting region corresponding to remaining areas, wherein the organic film pattern exposes the insulating film over the gate and data pad lower electrodes; removing the exposed insulating film to form contact holes on the gate and data pad lower electrodes; ashing the organic film pattern to form an organic material layer over the thin film transistor and the data line; and forming a common electrode of slit shapes on the substrate to overlap with the pixel electrode using a sixth mask such that the insulating film is interposed between the common electrode and the pixel electrode, wherein the organic material layer is formed of a light shielding material. - View Dependent Claims (2, 3, 4)
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Specification