Solution composition for passivation layer, thin film transistor array panel, and manufacturing method for thin film transistor array panel
First Claim
1. A thin film transistor array panel comprising:
- a substrate;
a gate line, a semiconductor layer, a source electrode, a data line, and a drain electrode disposed on the substrate; and
a passivation layer disposed on the gate line, the semiconductor layer, and the data line, wherein the semiconductor layer is in direct contact with the passivation layer, the passivation layer including an organic siloxane resin represented by Chemical Formula 1 below;
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Accused Products
Abstract
A passivation layer solution composition is provided. A passivation layer solution composition according to an exemplary embodiment of the present invention includes an organic siloxane resin represented by Chemical Formula 1 below.
In Chemical Formula 1, R is at least one substituent selected from a saturated hydrocarbon or an unsaturated hydrocarbon having from 1 to about 25 carbon atoms, and x and y may each independently be from 1 to about 200, and wherein each wavy line indicates a bond to an H atom or to an x siloxane unit or a y siloxane unit, or a bond to an x siloxane unit or a y siloxane unit of another siloxane chain comprising x siloxane units or y siloxane units or a combination thereof.
17 Citations
9 Claims
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1. A thin film transistor array panel comprising:
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a substrate; a gate line, a semiconductor layer, a source electrode, a data line, and a drain electrode disposed on the substrate; and a passivation layer disposed on the gate line, the semiconductor layer, and the data line, wherein the semiconductor layer is in direct contact with the passivation layer, the passivation layer including an organic siloxane resin represented by Chemical Formula 1 below; - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification