Structure for heavy ion tolerant device, method of manufacturing the same and structure thereof

• US 8,890,256 B2
• Filed: 03/20/2009
• Issued: 11/18/2014
• Est. Priority Date: 03/20/2009
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Hakey, Mark C., Ning, Tak H., Oldiges, Philip J., Tang, Henry H. K.
• Primary Examiner(s): VU, HUNG K
• Application Number:
  US12/408,205
• Publication Number:
  US 20100237389A1
• Time in Patent Office: 2,069 Days
• Field of Search: 257/204, 257/206, 257341-343, 257/369, 257/371, 257/401, 257/E21.632, 257/E27.062, 438/199
• US Class Current: 257/369
• CPC Class Codes: H01L 21/823418 with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
• CPC Class Codes: H01L 21/823481 isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
• CPC Class Codes: H01L 21/823814 with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
• CPC Class Codes: H01L 21/823878 isolation region manufacturing related aspects, e.g. to avoid interaction of isolation region with adjacent structure
• CPC Class Codes: H01L 21/84 the substrate being other than a semiconductor body, e.g. being an insulating body
• CPC Class Codes: H01L 27/12 the substrate being other than a semiconductor body, e.g. an insulating body
• CPC Class Codes: H01L 29/78 with field effect produced by an insulated gate H01L29/7725, H01L29/775, H01L29/778 take precedence

Abstract

The invention relates to a design structure, and more particularly, to a design structure for a heavy ion tolerant device, method of manufacturing the same and a structure thereof. The structure includes a first device having a diffusion comprising a drain region and source region and a second device having a diffusion comprising a drain region and source region. The first and second device are aligned in an end-to-end layout along a width of the diffusion of the first device and the second device. A first isolation region separating the diffusion of the first device and the second device.

Claims

1. A structure, comprising:

a gate having a length extending in a first direction and a width extending in a second direction;

a first device having a first diffusion comprising a drain region and a source region, wherein the first diffusion has a length extending in the first direction and a width extending in the second direction;

a second device having a second diffusion comprising a drain region and a source region, wherein the second diffusion has a length extending in the first direction and a width extending in the second direction; and

a first isolation region separating the first diffusion of the first device and the second diffusion of the second device,

wherein;

the first device and the second device are aligned in the second direction in an end-to-end layout along the width of the gate;

the width of the first diffusion of the first device is a first multiple of the length of the gate or of a channel length of the structure;

the width of the second diffusion of the second device is the first multiple of the length of the gate or of the channel length of the structure; and

the width of the first diffusion of the first device and the width of the second diffusion of the second device range from about 2×

to about 10×

of the length of the gate or of the channel length.

2. The structure of claim 1, wherein:

the gate comprises a common gate for both the first device and the second device; and

the common gate is a metal gate or poly gate and extends in the first direction.

3. The structure of claim 1, wherein:

the drain region of the first device is aligned with the source region of the second device along the first direction; and

the source region of the first device is aligned with the drain region of the second device along the first direction.

4. The structure of claim 1, wherein:

the drain region of the first device is aligned with the drain region of the second device along the first direction; and

the source region of the first device is aligned with the source region of the second device along the first direction.

5. The structure of claim 1, wherein the first isolation region is about 1×

to about 2×

of the length of the gate or of the channel length.

6. The structure of claim 1, wherein the width of the first diffusion of the first device and the width of the second diffusion of the second device range from about 6×

to about 10×

of the length of the gate or of the channel length.

7. The structure of claim 1, wherein the first device and the second device have a layout such that a high energy particle passing through either the first device or the second device in a horizontal or vertical direction with respect to the length of the gate or the channel length will not hit the other device.

8. The structure of claim 1, further comprising:

a third device having a third diffusion comprising a drain region and source region, wherein the third diffusion has a length extending in the first direction and a width extending in the second direction; and

a fourth device having a fourth diffusion comprising a drain region and source region, wherein the fourth diffusion has a length extending in the first direction and a width extending in the second direction, wherein;

the first and second devices are a first type device and the third and fourth devices are a second type device, different than the first type device,

the third and fourth devices are aligned in an end-to-end layout along the width of the gate;

the diffusion of the third device and the diffusion of the fourth device are separated by a second isolation region, and

the first, second, third and fourth devices have a layout that is an interleaved pattern.

9. The structure of claim 8, wherein the interleaved pattern comprising the first device, the third device, the second device and the fourth device, in order.

10. A structure, comprising:

a gate having a length extending in a first direction and a width extending in a second direction;

a first device having a diffusion comprising a drain region and a source region, wherein the diffusion has a length extending in the first direction and a width extending in the second direction; and

a second device having a diffusion comprising a drain region and a source region, wherein the second diffusion has a length extending in the first direction and a width extending in the second direction,

wherein;

the first and second device are aligned in an end-to-end layout along the width of the diffusion of the first device and the width of the diffusion of the second device;

a first isolation region separates the diffusion of the first device and the diffusion of the second device; and

the drain region of the first device is electrically connected to the source region of the second device

a length of the first isolation region is about twice a channel length of the first device and second device;

the width of the diffusion of the first device and the width of the diffusion of the second device range from about 6×

to about 10×

of the channel length; and

the first device and the second device have a layout such that a high energy particle passing through either the first device or the second device in a horizontal or vertical direction with respect to the channel length will not hit the other device.

11. The structure of claim 10, wherein:

a body of the structure is bounded in the first direction by the first diffusion region and the second diffusion region;

the body of the structure is bounded in the second direction by isolation regions,

the body of the structure is bounded vertically on a top by a gate insulator underneath a gate electrode;

the body of the structure is bounded at a bottom by a buried oxide;

the gate comprises a common gate for both the first device and the second device; and

the common gate is a metal gate or poly gate and extends in the first direction.

12. A structure comprising:

a gate having a length extending in a first direction and a width extending in a second direction;

a first device having a first diffusion comprising a drain region and a source region, wherein the first diffusion has a length extending in the first direction and a width extending in the second direction;

a second device having a second diffusion comprising a drain region and a source region, wherein the second diffusion has a length extending in the first direction and a width extending in the second direction; and

a first isolation region separating the first diffusion of the first device and the second diffusion of the second device,

wherein;

the first device and the second device are aligned in the second direction in an end-to-end layout along the width of the gate;

the width of the first diffusion of the first device is a first multiple of the length of the gate or of a channel length of the structure;

the width of the second diffusion of the second device is the first multiple of the length of the gate or of the channel length of the structure;

the first device and the second device are a same type device;

the first isolation region is about 1×

to about 2×

of the length of the gate or the channel length;

the width of the diffusion of the first device and the width of the diffusion of the second device range from about 6×

to about 10×

of the gate length or channel length;

the drain region of the first device is electrically connected to the source region of the second device; and

the first device and the second device have a layout such that a high energy particle passing through either the first device or the second device in a horizontal or vertical direction with respect to the length of the gate or the channel length will not hit the other device.

13. A structure, comprising:

a first device having a first diffusion area;

a second device having a second diffusion area;

a first isolation region isolating the first device from the second device; and

a common gate associated with the first device and the second device,

wherein;

the common gate provides a channel in the diffusion area of the first device and in the diffusion area of the second device;

a length of the common gate extends in a first direction that is along a length of the channel;

a width of the common gate extends in a second direction that is perpendicular to the length of the channel;

a width of the first diffusion area of the first device extends in the second direction;

a width of the diffusion area of the second device extends in the second direction;

the width of the first diffusion area is aligned with the width of the second diffusion area in an end-to-end layout along the second direction;

the first isolation region extends in the first direction between the first diffusion area and the second diffusion area;

the width of the first diffusion area is a first multiple of a gate length or channel length of the common gate;

the width of the second diffusion area is the first multiple of the gate length or channel length of the common gate; and

the width of the first diffusion area and the width of the second diffusion area range from about 2×

to about 10×

of the gate length or the channel length.

14. The structure of claim 13, further comprising:

a third device having a third diffusion area;

a fourth device having a fourth diffusion area; and

a second isolation region isolating the third diffusion area wherein;

the third and fourth devices are a second type device, different than the first and second devices,

the third diffusion area and the fourth diffusion area have respective lengths extending in the first direction and respective widths extending in the second direction,

the widths of the third and fourth devices are aligned in an end-to-end layout along the second direction,

the third and fourth devices are separated along the second direction by the second isolation region, and

the first, second, third and fourth devices have a layout in an interleaved pattern.

15. The structure of claim 13, wherein:

the first diffusion area and the second diffusion area each include a drain region and a source region;

the drain region of the first diffusion region is aligned with the source region of the second diffusion region along the second direction; and

the source region of the first diffusion region is aligned with the drain region of the second diffusion region along the second direction.

16. The structure of claim 13, wherein:

the first diffusion area and the second diffusion area each include a drain region and a source region;

the drain region of the first diffusion region is aligned with the drain region of the second diffusion region along the second direction; and

the source region of the first diffusion region is aligned with the source region of the second diffusion region along the second direction.

17. The structure of claim 13, wherein:

the first isolation region is about 1×

to about 2×

of the gate length or the channel length;

the width of the first diffusion area and the width of the second diffusion area range from about 6×

to about 10×

of the gate length or the channel length;

a drain region of the first device is electrically connected to a source region of the second device; and

the first device and the second device have a layout such that a high energy particle hitting either the first device or the second device in a direction of the gate length or the channel length will not result in a single event upset (SEU).

18. The structure of claim 13, wherein the first device and the second device have a layout such that a high energy particle passing through either the first device or the second device in a horizontal or vertical direction with respect to the gate length or the channel length will not hit the other device.

19. A method of forming a structure, comprising:

forming a first device with a first diffusion comprising a drain region and source region, wherein;

a length of the first diffusion extends in a first direction;

a width of the first diffusion extends in a second direction that is perpendicular to the first direction that is along a length of a gate; and

the width of the first diffusion is a first multiple of the gate length or a channel length of the structure;

forming a second device with a second diffusion comprising a drain region and source region, wherein;

a length of the second diffusion extends in the first direction;

a width of the second diffusion extends in the second direction;

the second diffusion is aligned with the first diffusion in an end-to-end layout along the second direction; and

the width of the second diffusion is the first multiple of the gate length or the channel length of the structure; and

forming an isolation region separating the first diffusion and the second diffusion, wherein a width of the isolation region is a second multiple of the gate length or the channel length of the structure;

wherein the width of the first diffusion and the width of the second diffusion range from about 2×

to about 10×

of the gate length or the channel length.

20. The method of claim 19, further comprising:

forming a third device with a third diffusion comprising a drain region and source region;

forming a fourth device with a fourth diffusion comprising a drain region and source region;

forming an a second isolation region separating the third diffusion and the fourth diffusion,

wherein;

the third diffusion area and the fourth diffusion area have respective lengths extending in the first direction and respective widths extending in the second direction,

the widths of the third and fourth devices are aligned in an end-to-end layout along the second direction,

the first device, the third device, the second device and the fourth device are arranged in an interleaved pattern in such order, and

the first device and the second device are a first type device and the third and fourth devices are a second type device, different from the first type device.

21. A design structure embodied in a machine readable medium for designing, manufacturing, or testing an integrated circuit, the design structure comprising:

a first device having a first diffusion comprising a drain region and source region, wherein the first diffusion has a length extending in the first direction and a width extending in the second direction;

a second device having a second diffusion comprising a drain region and source region, wherein the second diffusion has a length extending in the first direction and a width extending in the second direction; and

a first isolation region separating the first diffusion and the second diffusion,

wherein;

the first direction extends along a gate length or channel length of the structure,

the first device and the second device are aligned in an end-to-end layout along the second direction;

the width of the first diffusion is a first multiple of the gate length or channel length of the design structure;

the width of the second diffusion is the first multiple of the gate length or channel length of the design structure; and

the width of the first diffusion and the width of the second diffusion range from about 2×

to about 10×

of the gate length or the channel length.

22. The design structure of claim 21, wherein the design structure comprises a netlist.

23. The design structure of claim 21, wherein the design structure resides on storage medium as a data format used for the exchange of layout data of integrated circuits.

24. The design structure of claim 21, wherein the design structure resides in a programmable gate array.