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Methods and system for model-based generic matching and tuning

  • US 8,893,058 B2
  • Filed: 05/14/2013
  • Issued: 11/18/2014
  • Est. Priority Date: 11/10/2008
  • Status: Active Grant
First Claim
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1. A computer-implemented method of tuning a to-be-tuned lithographic process to a reference lithographic process, comprising:

  • obtaining separate and distinct respective lithographic process models for both the reference lithographic process and the to-be-tuned lithographic process;

    identifying a set of tunable parameters of the to-be-tuned lithographic process, wherein the tunable parameters are distinct and independent from patterns on a design layout to be imaged using the to-be-tuned lithographic process;

    identifying a nominal condition of the set of tunable parameters;

    determining changes from the nominal condition of the set of tunable parameters that cause an imaging performance of the to-be-tuned lithographic process to substantially match the reference lithographic process using the separate and distinct respective lithographic process models, wherein the step of determining changes includes establishing a substantially linear relationship between changes in the set of tunable parameters and changes in the to-be-tuned lithographic process model; and

    adjusting the to-be-tuned lithographic process based on the determined changes,wherein one or more of the obtaining, identifying, determining changes, and adjusting steps are implemented by the computer.

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