System and method for lithography simulation
First Claim
1. A system for performing a simulation of a lithographic process for fabricating an integrated circuit represented by circuit design data comprising a plurality of polygons, the system comprising:
- a managing computer processor that converts the plurality of polygons in the circuit design data into a pixel-based bitmap representation of the integrated circuit; and
a plurality of specially programmed computer processors, coupled to the managing computer processor, that each perform a respective portion of the simulation using the pixel-based bitmap representation of the integrated circuit,wherein the managing computer combines the respective portions to form an overall result of the simulation.
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Abstract
In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.
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Citations
18 Claims
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1. A system for performing a simulation of a lithographic process for fabricating an integrated circuit represented by circuit design data comprising a plurality of polygons, the system comprising:
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a managing computer processor that converts the plurality of polygons in the circuit design data into a pixel-based bitmap representation of the integrated circuit; and a plurality of specially programmed computer processors, coupled to the managing computer processor, that each perform a respective portion of the simulation using the pixel-based bitmap representation of the integrated circuit, wherein the managing computer combines the respective portions to form an overall result of the simulation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A system for performing a simulation of a lithographic process for fabricating an integrated circuit represented by circuit design data comprising a plurality of polygons, the system comprising:
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a managing computer processor that converts the plurality of polygons in the circuit design data into a pixel-based bitmap representation of the integrated circuit; a plurality of specially programmed computer processors, coupled to the managing computer processor, that each perform a respective portion of the simulation using the pixel-based bitmap representation of the integrated circuit, and wherein each of the plurality of specially programmed computer processors operates in parallel with the other specially programmed computer processors, and wherein the managing computer combines the respective portions to form an overall result of the simulation. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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Specification