Methods and apparatus for detecting the confinement state of plasma in a plasma processing system

• US 8,901,935 B2
• Filed: 10/19/2010
• Issued: 12/02/2014
• Est. Priority Date: 11/19/2009
• Status: Active Grant

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Rogers, James, Valcore, John C. Jr.
• Primary Examiner(s): Phan, Huy Q
• Assistant Examiner(s): Astacio-Oquendo, Giovanni
• Application Number:
  US12/907,859
• Publication Number:
  US 20110115492A1
• Time in Patent Office: 1,505 Days
• Field of Search: 324/464, 324/536, 324/713, 156/627.1, 216/60, 361/234, 427/533, 438/7, 700/121
• US Class Current: 324/464
• CPC Class Codes: G01N 27/62 by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode

Abstract

Methods and systems for detecting a change in the state of plasma confinement within a capacitively coupled RF driven plasma processing chamber are disclosed. In one or more embodiments, the plasma unconfinement detection methods employ an analog or digital circuit that can actively poll the RF voltage at the powered electrode in the form of an Electrostatic Chuck (ESC) as well as the open loop response of the power supply (PSU) responsible for chucking a wafer to ESC. The circuit provides a means detecting both a change in RF voltage delivered to the ESC as well as a change in the open loop response of the PSU. By simultaneously monitoring these electrical signals, the disclosed algorithm can detect when plasma changes from a confined to an unconfined state.

Claims

1. A method for detecting plasma unconfinement in a plasma processing chamber, said plasma processing chamber having an electrostatic (ESC) chuck, comprising:

providing an RF voltage to said ESC chuck;

providing a ESC power supply unit configured to provide a DC bias voltage to said ESC chuck, said ESC power supply unit having a center tap coupled to receive said RF voltage;

simultaneously monitoring said RF voltage and said center tap for changes indicative of a plasma unconfinement condition wherein said monitoring includes detecting a positive derivative of a change in said RF voltage; and

providing a signal to indicate a presence of said plasma unconfinement condition if said plasma unconfinement condition is detected by said monitoring.

2. The method of claim 1 wherein said RF voltage is a broadband RF voltage comprising at least two RF frequencies.

3. The method of claim 1 wherein said monitoring further includes ascertaining whether a magnitude of said change exceeds a predefined threshold.

4. The method of claim 1 wherein said monitoring includes detecting said change in an open-loop DC response on said center tap.

5. The method of claim 4 wherein said monitoring further includes ascertaining whether a magnitude of said change exceeds a predefined threshold.

6. The method of claim 1 wherein said monitoring includes detecting said change in an open-loop DC response on said center tap.

7. The method of claim 6 wherein said open-loop DC response represents an open-loop DC voltage.

8. The method of claim 6 wherein said open-loop DC response represents an open-loop DC current.

9. The method of claim 1 wherein said monitoring includes detecting a rate of change in said RF voltage and detecting a rate of said change in an open-loop DC response on said center tap.

10. The method of claim 1 wherein said signal is employed as a feedback signal to automatically initiate corrective action in response to a detection of said plasma unconfinement condition.

11. An arrangement for detecting plasma unconfinement in a plasma processing chamber, said plasma processing chamber having an electrostatic (ESC) chuck, said ESC chuck being configured to receive an RF voltage, comprising:

a ESC power supply unit configured to provide a DC bias voltage to said ESC chuck, said ESC power supply unit having a center tap coupled to receive said RF voltage; and

means for analyzing said RF voltage and an open-loop DC response on said center tap for changes indicative of a plasma unconfinement condition wherein said means for analyzing said RF includes means for detecting a positive derivative of a change in said RF voltage.

12. The arrangement of claim 11 wherein said RF voltage is a broadband RF voltage comprising at least two RF frequencies.

13. The arrangement of claim 11 wherein said means for analyzing is further configured to ascertain whether a magnitude of said change in said RF voltage exceeds a predefined threshold.

14. The arrangement of claim 11 wherein said means for analyzing is configured to at least detect said change in an open-loop DC response on said center tap.

15. The arrangement of claim 11 wherein said means for analyzing is further configured to ascertain whether a magnitude of said change in said open-loop DC response exceeds a predefined threshold.

16. The arrangement of claim 11 wherein said open-loop DC response represents an open-loop DC voltage.

17. The arrangement of claim 11 wherein said means for analyzing includes detecting a rate of said change in said RF voltage and detecting a rate of change in an open-loop DC response on said center tap.