Lithographic apparatus and device manufacturing method

• US 8,908,144 B2
• Filed: 09/27/2006
• Issued: 12/09/2014
• Est. Priority Date: 09/27/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Groeneveld, Rogier Herman Mathijs, Van Dijsseldonk, Antonius Johannes Josephus, Franken, Dominicus Jacobus Petrus Adrianus, Jansen, Bastiaan Stephanus Hendricus, De Jongh, Robertus Johannes Marinus, Van Der Wijst, Marc Wilhelmus Maria, Wijckmans, Maurice Willem Jozef Etinne
• Primary Examiner(s): Asfaw, Mesfin T
• Application Number:
  US11/527,729
• Publication Number:
  US 20080074629A1
• Time in Patent Office: 2,995 Days
• Field of Search: 355/53, 355/72, 355/77
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

Claims

1. A lithographic apparatus, comprising:

a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system; and

a control system to counteract a position error of the substrate table and the support relative to the projection system, wherein the control system comprises an acceleration sensor to provide an acceleration signal representative of an acceleration of the projection system and wherein the control system is configured to derive a support feed-forward signal and a substrate table feed-forward signal from the acceleration signal, the support feed-forward signal to be provided to a support actuator and the substrate table feed-forward signal to be provided to a substrate table actuator.

2. The lithographic apparatus according to claim 1, wherein the acceleration sensor is configured to provide a six degrees of freedom acceleration signal.

3. The lithographic apparatus according to claim 1, wherein a maximum frequency of the feed-forward signals is substantially equal to or larger than a vibration cut-off frequency of the resilient mount.

4. The lithographic apparatus according to claim 1, further comprising a projection system position sensor to provide a projection system position signal representative of a position of the projection system relative to the reference element and wherein the control system is configured to drive a projection system actuator to dampen a movement of the projection system relative to the reference element based on the projection system position signal.

5. The lithographic apparatus according to claim 1, wherein the projection system comprises a projection mirror.

6. The lithographic apparatus according to claim 5, wherein the projection mirror is stabilized relative to a projection system frame, the projection system frame holding the projection mirror.

7. The lithographic apparatus according to claim 6, wherein the projection mirror is stabilized to follow movements of the projection system via a feed-forward control.

8. A device manufacturing method, comprising:

supporting a patterning device by a support, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;

holding a substrate by a substrate table;

projecting the patterned radiation beam onto a target portion of the substrate using a projection system, the projection system mounted to a reference element by a resilient mount to reduce a transfer of high frequency vibration of the reference element to the projection system;

determining an acceleration signal representative of an acceleration of the projection system;

counteracting a position error of the substrate table and the support relative to the projection system by

deriving a support feed-forward signal and a substrate table feed-forward signal from the acceleration signal;

providing the support feed-forward signal to the support actuator; and

providing the substrate table feed-forward signal to the substrate table actuator;

developing the irradiated substrate; and

manufacturing a device from the developed substrate.

9. The method according to claim 8, wherein the projection system comprises a projection mirror.

10. The method according to claim 9, wherein the projection mirror is stabilized relative to a projection system frame, the projection system frame holding the projection mirror.

11. The method according to claim 9, further comprising stabilizing the projection mirror to follow movements of the projection system via a feed-forward control.