Lithographic apparatus and device manufacturing method
First Claim
1. A lithographic apparatus, comprising:
- a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system; and
a control system to counteract a position error of the substrate table and the support relative to the projection system, wherein the control system comprises an acceleration sensor to provide an acceleration signal representative of an acceleration of the projection system and wherein the control system is configured to derive a support feed-forward signal and a substrate table feed-forward signal from the acceleration signal, the support feed-forward signal to be provided to a support actuator and the substrate table feed-forward signal to be provided to a substrate table actuator.
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Accused Products
Abstract
A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.
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Citations
11 Claims
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1. A lithographic apparatus, comprising:
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a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system; and a control system to counteract a position error of the substrate table and the support relative to the projection system, wherein the control system comprises an acceleration sensor to provide an acceleration signal representative of an acceleration of the projection system and wherein the control system is configured to derive a support feed-forward signal and a substrate table feed-forward signal from the acceleration signal, the support feed-forward signal to be provided to a support actuator and the substrate table feed-forward signal to be provided to a substrate table actuator. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A device manufacturing method, comprising:
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supporting a patterning device by a support, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; holding a substrate by a substrate table; projecting the patterned radiation beam onto a target portion of the substrate using a projection system, the projection system mounted to a reference element by a resilient mount to reduce a transfer of high frequency vibration of the reference element to the projection system; determining an acceleration signal representative of an acceleration of the projection system; counteracting a position error of the substrate table and the support relative to the projection system by deriving a support feed-forward signal and a substrate table feed-forward signal from the acceleration signal; providing the support feed-forward signal to the support actuator; and providing the substrate table feed-forward signal to the substrate table actuator; developing the irradiated substrate; and manufacturing a device from the developed substrate. - View Dependent Claims (9, 10, 11)
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Specification