Method of fabricating and correcting nanoimprint lithography templates
First Claim
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1. A method of fabricating a nanoimprint lithography template, comprising:
- fabricating a first nanoimprint lithography template having a plurality of chip areas;
forming a plurality of pattern areas corresponding to the plurality of chip areas on a semiconductor wafer using the first nanoimprint lithography template;
determining a deviation of a layout of the pattern areas from a desired layout of the pattern area; and
fabricating a second nanoimprint lithography template that corrects the deviation, wherein fabricating the second nanoimprint lithography template that corrects the deviation comprises;
installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage, and a template stage;
mounting a template substrate on the template stage; and
exposing regions on the template substrate with light emitted by the light source in a scanning process performed by the scanning lithography equipment, characterized in that at least one part of the scanning lithography equipment is inclined such that a line passing through a center of light exposing each of the regions, respectively, in a first direction in which the light propagates towards the template substrate is incident on the exposure region at an oblique angle.
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Abstract
A method of fabricating a nanoimprint lithography template includes installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage and a template stage, mounting a template substrate on the template stage, and scanning the template substrate with light from the light source in an exposure process in which the light passes through the reticle and impinges the template substrate at an oblique angle of incidence.
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Citations
15 Claims
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1. A method of fabricating a nanoimprint lithography template, comprising:
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fabricating a first nanoimprint lithography template having a plurality of chip areas; forming a plurality of pattern areas corresponding to the plurality of chip areas on a semiconductor wafer using the first nanoimprint lithography template; determining a deviation of a layout of the pattern areas from a desired layout of the pattern area; and fabricating a second nanoimprint lithography template that corrects the deviation, wherein fabricating the second nanoimprint lithography template that corrects the deviation comprises; installing a reticle on a reticle stage of scanning lithography equipment having a light source, the reticle stage, and a template stage; mounting a template substrate on the template stage; and exposing regions on the template substrate with light emitted by the light source in a scanning process performed by the scanning lithography equipment, characterized in that at least one part of the scanning lithography equipment is inclined such that a line passing through a center of light exposing each of the regions, respectively, in a first direction in which the light propagates towards the template substrate is incident on the exposure region at an oblique angle. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification