Scanning electron microscope

• US 8,921,784 B2
• Filed: 11/12/2010
• Issued: 12/30/2014
• Est. Priority Date: 11/26/2009
• Status: Active Grant

• Current Assignee: Hitachi High-Tech Company Limited (Hitachi, Ltd.)
• Original Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Inventors: Kobori, Sakae, Ohtaki, Tomohisa, Hatano, Haruhiko, Iwaya, Toru
• Primary Examiner(s): Kim, Robert
• Assistant Examiner(s): CHOI, JAMES J
• Application Number:
  US13/505,517
• Publication Number:
  US 20120211654A1
• Time in Patent Office: 1,509 Days
• Field of Search: 250/310
• US Class Current: 250/311
• CPC Class Codes: H01J 37/04 Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement electron or ion-optical systems for localised treatment of materials H01J37/3007; discharge control means in gas filled discharge tubes H01J37/32009
• CPC Class Codes: H01J 37/141 Electromagnetic lenses
• CPC Class Codes: H01J 37/143 Permanent magnetic lenses
• CPC Class Codes: H01J 37/26 Electron or ion microscopes; Electron or ion diffraction tubes
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.

Claims

1. A scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons or backscattered electrons from the sample, comprising:

a Wehnelt electrode or an anode electrode adapted to change an accelerating voltage; and

an objective aperture adapted to regulate the electron beam, wherein

the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens,

the permanent magnet-type condenser lens is arranged in the scanning electron microscope to focus the electron beam emitted from the electron source,

the electromagnetic coil-type condenser lens is arranged in the scanning electron microscope after the permanent magnet-type condenser lens to focus the electron beam focused by the permanent magnet-type condenser lens, and

the electromagnetic coil-type condenser lens is adapted to be controlled to change a position in an up/down direction of a cross-over created between the electromagnetic coil-type condenser lens and an objective lens, to adjust a spot size on the sample, and to adjust a probe current.

2. The scanning electron microscope according to claim 1, wherein the topmost condenser lens is of a permanent magnet-type.

3. The scanning electron microscope according to claim 1, further comprising a deflector that corrects the optical axis of the electron beam, the deflector being provided in at least one of the following manners:

below, concentric with, and above the permanent magnet-type condenser lens.

4. The scanning electron microscope according to claim 2, further comprising a deflector that corrects the optical axis of the electron beam, the deflector being provided in at least one of the following manners:

below, coaxially with, and above the permanent magnet-type condenser lens.

5. A scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons or backscattered electrons from the sample, comprising:

a Wehnelt electrode or an anode electrode adapted to change an accelerating voltage; and

an objective aperture adapted to regulate the electron beam, wherein

the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens,

the electromagnetic coil-type condenser lens is arranged in the scanning electron microscope to focus the electron beam emitted from the electron source,

the permanent magnet-type condenser lens is arranged in the scanning electron microscope after the electromagnetic coil-type condenser lens to focus the electron beam focused by the electromagnetic coil-type condenser lens, and

the electromagnetic coil-type condenser lens is adapted to be controlled to change a position in an up/down direction of a cross-over created between the electromagnetic coil-type condenser lens and an objective lens, to adjust a spot size on the sample, and to adjust a probe current.

6. The scanning electron microscope according to claim 5, further comprising a deflector that corrects the optical axis of the electron beam, the deflector being provided in at least one of the following manners:

below, concentric with, and above the permanent magnet-type condenser lens.