Method for cleaning a surface
First Claim
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1. A method for spray cleaning a surface of a plate-like article, comprising the steps:
- treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow,treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets,wherein the surface is treated with a spray cleaning step before the free flow cleaning step and a spray cleaning step after the free flow cleaning step, and at least two of the spray cleaning steps are run for 5 s to 45 s each, and the droplets have a mean diameter D30 of between 0.001 mm and 0.1 mm.
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Abstract
A method for cleaning a surface of a plate-like article includes the steps of:
- treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow, and
- treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets. The surface is treated with a spray cleaning step before the free flow cleaning step and a spray cleaning step after the free flow cleaning step.
14 Citations
20 Claims
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1. A method for spray cleaning a surface of a plate-like article, comprising the steps:
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treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow, treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets, wherein the surface is treated with a spray cleaning step before the free flow cleaning step and a spray cleaning step after the free flow cleaning step, and at least two of the spray cleaning steps are run for 5 s to 45 s each, and the droplets have a mean diameter D30 of between 0.001 mm and 0.1 mm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 19)
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16. A method for spray cleaning a surface of a structured semiconductor wafer, comprising:
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A—
treating the surface with free flow cleaning, wherein liquid is dispensed through a dispense nozzle onto the surface in a continuous liquid flow;B—
treating the surface with spray cleaning, wherein liquid is directed through a spray nozzle towards the surface in form of droplets, wherein the droplets have a mean diameter D30 of between 0.001 mm and 0.1 mm;R—
rinsing, wherein de-ionized water is supplied in a free flow; andD—
drying to remove the liquid from the surface,wherein a basic process sequence is R-B-A-B-R-D with the core sequence B-A-B is preceded with a pre-rinse and succeeded by a rinse and dry sequence, and at least two of the spray cleaning steps B are run for 5 s to 45 s each. - View Dependent Claims (17, 18, 20)
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Specification