Method and system for co-packaging gallium nitride electronics
First Claim
1. An electronic package comprising:
- a leadframe;
a plurality of pins;
a gallium nitride (GaN) transistor comprising a drain region, a drift region, a source region, and a gate region, wherein;
the drain region comprises a GaN substrate and a drain contact;
the drift region comprises a first GaN epitaxial layer coupled to the GaN substrate;
the source region is separated from the GaN substrate by the drift region and comprises a source contact;
the gate region comprises a second GaN epitaxial layer coupled to the first GaN epitaxial layer and a gate contact;
a GaN diode comprising an anode region and a cathode region, wherein;
the cathode region comprises the GaN substrate and a cathode contact; and
the anode region comprises a third GaN epitaxial layer coupled to the GaN substrate and an anode contact;
wherein the drain contact and the anode contact are electrically connected to the leadframe.
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Abstract
An electronic package includes a leadframe, a plurality of pins, a gallium-nitride (GaN) transistor, and a GaN diode. The GaN transistor includes a drain region, a drift region, a source region, and a gate region; the drain region includes a GaN substrate and a drain contact, the drift region includes a first GaN epitaxial layer coupled to the GaN substrate, the source region includes a source contact and is separated from the GaN substrate by the drift region, and the gate region includes a second GaN epitaxial layer and a gate contact. The GaN diode includes an anode region and a cathode region, the cathode region including the GaN substrate and a cathode contact, and the anode region including a third GaN epitaxial layer coupled to the GaN substrate and an anode contact. The drain contact and the anode contact are electrically connected to the leadframe.
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Citations
11 Claims
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1. An electronic package comprising:
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a leadframe; a plurality of pins; a gallium nitride (GaN) transistor comprising a drain region, a drift region, a source region, and a gate region, wherein; the drain region comprises a GaN substrate and a drain contact; the drift region comprises a first GaN epitaxial layer coupled to the GaN substrate; the source region is separated from the GaN substrate by the drift region and comprises a source contact; the gate region comprises a second GaN epitaxial layer coupled to the first GaN epitaxial layer and a gate contact; a GaN diode comprising an anode region and a cathode region, wherein; the cathode region comprises the GaN substrate and a cathode contact; and the anode region comprises a third GaN epitaxial layer coupled to the GaN substrate and an anode contact; wherein the drain contact and the anode contact are electrically connected to the leadframe. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification