Lithographic apparatus and device manufacturing method

• US 8,941,810 B2
• Filed: 05/26/2011
• Issued: 01/27/2015
• Est. Priority Date: 12/30/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Zaal, Koen Jacobus Johannes Maria, Ottens, Joost Jeroen
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/116,766
• Publication Number:
  US 20110222036A1
• Time in Patent Office: 1,342 Days
• Field of Search: 355/30, 355/53, 355/72, 250/548
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

Claims

1. An apparatus, comprising:

a substrate table arranged to hold a substrate during exposure in an immersion lithographic apparatus;

a cover plate, physically separate from the substrate table, positioned outward of the substrate during exposure, the cover plate configured to provide a surface, facing a projection system of the immersion lithographic apparatus, that is substantially adjacent to the substrate; and

a plurality of burls arranged between the substrate table and the cover plate.

2. The apparatus according to claim 1, wherein the plurality of burls are provided on the substrate table to support the cover plate.

3. The apparatus according to claim 1, wherein the plurality of burls are provided on the cover plate.

4. The apparatus according to claim 1, further comprising a reflective surface of the substrate table, the cover plate, or both.

5. The apparatus according to claim 1, further comprising the immersion lithographic apparatus, the immersion lithographic apparatus, comprising:

the projection system to project a modulated radiation beam onto the substrate, and

a liquid supply system to provide a liquid in a region between the projection system and the substrate during exposure.

6. The apparatus according to claim 1, wherein the cover plate is detachably mounted on the plurality of burls.

7. The apparatus according to claim 1, wherein the plurality of burls are arranged to have low thermal conductivity, minimal contact area with the cover plate, minimal contact area with the substrate table, or any combination selected from the foregoing.

8. The apparatus according to claim 1, wherein the plurality of burls extend under the cover plate and under the substrate when supported by the substrate table, a support surface of the plurality of burls under the cover plate and the substrate forming a substantially flat plane.

23. The apparatus according to claim 4, comprising the cover plate having the reflective surface.

24. The apparatus according to claim 4, wherein the substrate table has a reflective surface at a position located underneath the cover plate.

9. A device manufacturing method, comprising:

projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table; and

supporting a cover plate, physically separate from the substrate table, on the substrate table at a position outward of the substrate during exposure using a plurality of protrusions arranged between the substrate table and the cover plate, the cover plate providing a surface that is substantially adjacent to a surface of the substrate onto which the modulated radiation beam is incident.

10. The method according to claim 9, wherein the plurality of protrusions are provided on the substrate table to support the cover plate.

11. The method according to claim 9, wherein the plurality of protrusions are provided on the cover plate.

12. The method according to claim 9, further comprising reflecting radiation using a reflective surface of the substrate table, the cover plate, or both.

13. The method according to claim 9, wherein the cover plate is detachably mounted on the plurality of protrusions.

14. The method according to claim 9, wherein the plurality of protrusions extend under the cover plate and under the substrate, a support surface of the plurality of protrusions under the cover plate and the substrate forming a substantially flat plane.

25. The method according to claim 12, comprising reflecting radiation using the reflective surface of the cover plate.

26. The method according to claim 12, comprising reflecting radiation using a reflective surface at a position located underneath the cover plate.

15. An apparatus, comprising:

a substrate table to hold a substrate;

a projection system to project a modulated radiation beam onto the substrate;

a liquid supply system to provide a liquid in a region between the projection system and the substrate table during exposure; and

a cover plate physically separate and removable from the substrate table, the cover plate positioned outward of the substrate during exposure and providing a surface facing the projection system that is adjacent to the substrate when supported by the substrate table, and the cover plate, the substrate table, or both, has a structure creating a void between the cover plate and the substrate table, the structure comprising a plurality of protrusions arranged between the substrate table and the cover plate.

16. The apparatus according to claim 15, wherein the substrate table has at least part of the structure and the void is a gap between the protrusions.

17. The apparatus according to claim 15, wherein the cover plate has at least part of the structure and the void is a gap between the protrusions.

18. The apparatus according to claim 15, wherein the substrate table has a plurality of protrusions under the substrate when supported by the substrate table, a surface of the plurality of protrusions of the structure and of the plurality of protrusions under the substrate forming a substantially flat plane.

19. The apparatus according to claim 15, wherein the structure forms a thermal insulator to reduce heat transfer from or to the cover plate.

20. The apparatus according to claim 15, wherein each protrusion has a generally triangular cross-section.

21. The apparatus according to claim 15, wherein the cover plate has a reflective surface.

22. The apparatus according to claim 15, wherein the substrate table has a reflective surface at a position located underneath the cover plate.