Lithographic apparatus and device manufacturing method

• US 8,941,811 B2
• Filed: 09/23/2011
• Issued: 01/27/2015
• Est. Priority Date: 12/20/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Jansen, Hans, Baselmans, Johannes Jacobus Matheus, Donders, Sjoerd Nicolaas Lambertus, Hoogendam, Christiaan Alexander, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Stavenga, Marco Koert, Streefkerk, Bob, Van Der Hoeven, Jan Cornelis, Grouwstra, Cedric Desire
• Primary Examiner(s): Asfaw, Mesfin T
• Application Number:
  US13/242,401
• Publication Number:
  US 20120008119A1
• Time in Patent Office: 1,222 Days
• Field of Search: 355/30, 355/53, 355/72, 355/77
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Abstract

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Claims

1. A lithographic apparatus, comprising:

a projection system configured to project a patterned beam of radiation onto a radiation-sensitive substrate, the projection system comprising a final optical element adjacent the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid in the space such that the liquid is in direct contact with the final optical element and the liquid confinement structure, the liquid confinement structure having an outlet configured to remove liquid from the space, the outlet being in a bottom surface of the liquid confinement structure and located on opposite sides of a path of the beam of radiation through the liquid; and

a stage movable with respect to the liquid confinement structure, the stage having an upper surface of at least same width as the width between the locations of the outlet on opposite sides of the path of the beam of radiation and the stage having a cleaning device configured to clean a surface of the final optical element, of the liquid confinement structure, or of both the final optical element and the liquid confinement structure, the cleaning device located in or under the upper surface.

2. The apparatus according to claim 1, wherein the cleaning device comprises an ultrasonic transmitter.

3. The apparatus according to claim 2, wherein the cleaning device further comprises an outlet, in the upper surface, to supply cleaning fluid.

4. The apparatus according to claim 2, further comprising an outlet to supply a cleaning fluid different from the liquid.

5. The apparatus according to claim 4, wherein the outlet to supply the cleaning fluid is part of the liquid confinement structure.

6. The apparatus according to claim 4, wherein the cleaning fluid comprises heptane, hexane, alcohol or acetone.

7. The apparatus according to claim 1, wherein the cleaning device comprises an optical element configured to supply radiation.

8. The apparatus according to claim 1, wherein the cleaning device further comprises an outlet, in the upper surface, to supply cleaning fluid.

9. The apparatus according to claim 1, further comprising an outlet to rinse the space with ultra pure water after a cleaning using the cleaning device.

10. The apparatus according to claim 1, wherein the upper surface is substantially flat and configured to cooperate with the bottom surface of the liquid confinement structure.

11. The apparatus according to claim 1, further comprising a control system configured to cause a cleaning beam of radiation to be projected, via the projection system, onto the stage.

12. An exposure apparatus, comprising:

a projection system configured to project a beam of radiation onto a radiation-sensitive substrate;

a liquid confinement structure configured to at least partly confine an immersion liquid in a space between the projection system and the substrate such that the immersion liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having a bottom surface extending laterally from a path of the beam of radiation through the liquid and an outlet, in the bottom surface, configured to remove immersion liquid, the liquid confinement structure configured to supply a cleaning fluid to contact the bottom surface during a cleaning operation; and

a stage movable with respect to the liquid confinement structure, the stage having a substantially flat upper surface and having, flush with or below the upper surface, a cleaning device, the cleaning device comprising an ultrasonic emitter configured to provide sonic waves to the cleaning fluid or an optical element to supply radiation to the cleaning fluid.

13. The apparatus according to claim 12, wherein the upper surface is wider than width of an aperture in the bottom surface through which the beam of radiation passes.

14. A device manufacturing method, comprising:

projecting a beam of radiation, using a projection system, onto a radiation-sensitive substrate;

at least partly confining a liquid in a space between the projection system and the substrate using a liquid confinement structure such that the liquid is in direct contact with the projection system and the liquid confinement structure, the liquid confinement structure having an outlet configured to remove liquid from the space, the outlet being in a bottom surface of the liquid confinement structure and located on opposite sides of a path of the beam of radiation through the liquid;

moving a stage with respect to the liquid confinement structure, the stage having an upper surface of at least same width as the width between the locations of the outlet on opposite sides of the path of the beam of radiation and the stage having a cleaning device located in or under the upper surface; and

cleaning a surface of the projection system, of the liquid confinement structure, or of both the projection system and the liquid confinement structure, using the cleaning device.

15. The method according to claim 14, wherein the cleaning device comprises an ultrasonic emitter and the cleaning comprising applying ultrasonic waves to a cleaning fluid.

16. The method according to claim 14, further comprising supplying a cleaning fluid, different from the liquid, for use during the cleaning.

17. The method according to claim 16, comprising supplying the cleaning fluid via an opening of the liquid confinement structure.

18. The method according to claim 16, comprising supplying the cleaning fluid via an outlet in the upper surface.

19. The method according to claim 14, wherein the cleaning comprises supplying radiation using an optical element of the cleaning device.

20. The method according to claim 14, further comprising causing a cleaning beam of radiation to be projected, via the projection system, onto the stage.

21. The method according to claim 14, wherein the upper surface is substantially flat and cooperates with the bottom surface of the liquid confinement structure.