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Lithographic apparatus and device manufacturing method

  • US 8,941,811 B2
  • Filed: 09/23/2011
  • Issued: 01/27/2015
  • Est. Priority Date: 12/20/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, comprising:

  • a projection system configured to project a patterned beam of radiation onto a radiation-sensitive substrate, the projection system comprising a final optical element adjacent the substrate;

    a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid in the space such that the liquid is in direct contact with the final optical element and the liquid confinement structure, the liquid confinement structure having an outlet configured to remove liquid from the space, the outlet being in a bottom surface of the liquid confinement structure and located on opposite sides of a path of the beam of radiation through the liquid; and

    a stage movable with respect to the liquid confinement structure, the stage having an upper surface of at least same width as the width between the locations of the outlet on opposite sides of the path of the beam of radiation and the stage having a cleaning device configured to clean a surface of the final optical element, of the liquid confinement structure, or of both the final optical element and the liquid confinement structure, the cleaning device located in or under the upper surface.

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