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Harmonic resist model for use in a lithographic apparatus and a device manufacturing method

  • US 8,942,463 B2
  • Filed: 03/25/2014
  • Issued: 01/27/2015
  • Est. Priority Date: 11/24/2008
  • Status: Active Grant
First Claim
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1. A method implemented by a computer processor for simulating a resist image, wherein the resist image comprises an image of a portion of a design layout to be lithographically projected onto a resist coated on a substrate, the method comprising:

  • determining an aerial image of the portion of the design layout at substrate level; and

    transforming the aerial image into the resist image by convolving the aerial image with selected convolution kernels having both linear and bilinear terms.

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