Surface wave plasma generating antenna and surface wave plasma processing apparatus

• US 8,945,342 B2
• Filed: 03/02/2012
• Issued: 02/03/2015
• Est. Priority Date: 03/02/2011
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Ikeda, Taro, Kasai, Shigeru, Osada, Yuki
• Primary Examiner(s): DHINGRA, RAKESH KUMAR
• Application Number:
  US13/410,957
• Publication Number:
  US 20120222816A1
• Time in Patent Office: 1,068 Days
• Field of Search: 156/345.41, 118/723.MW
• US Class Current: 156/345.41
• CPC Class Codes: C23C 16/274 using microwave discharges
• CPC Class Codes: H01J 37/3222 Antennas

Abstract

A surface wave plasma generating antenna serves to generate a surface wave plasma in a chamber by radiating into the chamber a microwave transmitted from a microwave output section through a coaxial waveguide including an outer conductor and an inner conductor. The surface wave plasma generating antenna is formed in a planar shape and has a plurality of slots arranged in a circumferential direction, and each joint portion between two adjacent slots in the circumferential direction is overlapped with at least one of the slots in a diametrical direction.

Claims

1. A surface wave plasma generating antenna for generating a surface wave plasma in a chamber by radiating into the chamber a microwave transmitted from a microwave output section through a coaxial waveguide including an outer conductor and an inner conductor, the surface wave plasma generating antenna comprising:

a planar shape member having a plurality of curved slots arranged along a circumferential direction and encircling a center of the planar shape member;

wherein

a joint portion of the planar shape member is formed by a radial separation between two circumferentially adjacent slots of the plurality of curved slots, wherein

end portions of the two circumferentially adjacent slots are overlapped with each other in a diametrical direction at each joint portion such that, along an entirety of the circumferentially direction of the plurality of curved slots encircling the center of the planar shape member, a curved slot exists.

2. The surface wave plasma generating antenna of claim 1, wherein

each of the plurality of curved slots has a central portion and a first and a second end portion extending from opposite sides of the central portion, and

the first end portion of one of the two adjacent slots and the second end portion of the other slot of the two adjacent slots are overlapped with each other in a diametrical direction.

3. The surface wave plasma generating antenna of claim 2, wherein the central portion, the first end portion and the second end portion of each of the curved slots have substantially the same length.

4. The surface wave plasma generating antenna of claim 3, wherein

the central portion of each of the curved slots has a width,

each of the first and the second end portion thereof has a width equal to or smaller than a half of the width of the central portion,

the overlapped portion between the first end portion and the second end portion has a width same as the width of the central portion, and

a region where the curved slots are provided is formed in a circular ring shape.

5. The surface wave plasma generating antenna of claim 3, wherein each of the curved slots has a thin and long shape and the curved slots are provided in a circular ring-shaped region,

the first end portion of each of the curved slots is positioned outwardly of the second end portion of the curved slot adjacent thereto, and the second end portion is positioned inwardly of the first end portion of the other adjacent thereto, and

the central portion of each of the curved slots is obliquely disposed to traverse from the outer portion of the circular ring-shaped region to the inner portion thereof.

6. The surface wave plasma generating antenna of claim 5, wherein the first and the second end portion of each of the curved slots have a circular arc shape.

7. The surface wave plasma generating antenna of claim 2, wherein

the central portion of each of the curved slots has a width,

each of the first and the second end portion thereof has a width equal to or smaller than a half of the width of the central portion,

the overlapped portion between the first end portion and the second end portion has a width same as the width of the central portion, and

a region where the curved slots are provided is formed in a circular ring shape.

8. The surface wave plasma generating antenna of claim 2, wherein each of the curved slots has a thin and long shape and the curved slots are provided in a circular ring-shaped region,

the first end portion of each of the curved slots is positioned outwardly of the second end portion of the curved slot adjacent thereto, and the second end portion is positioned inwardly of the first end portion of the other adjacent thereto, and

the central portion of each of the curved slots is obliquely disposed to traverse from the outer portion of the circular ring-shaped region to the inner portion thereof.

9. The surface wave plasma generating antenna of claim 8, wherein the first and the second end portion of each of the curved slots have a circular arc shape.

10. A surface wave plasma generating apparatus comprising:

a chamber for accommodating therein a substrate to be processed;

a gas supply mechanism for supplying a gas into the chamber; and

a microwave plasma source for generating a surface wave plasma of the gas into the chamber by introducing a microwave into the chamber, the microwave plasma source including a microwave output section having a microwave power supply, for outputting a generated microwave; and

a microwave introducing mechanism for introducing the outputted microwave into the chamber,

wherein the microwave introducing mechanism includes a coaxial waveguide having an outer conductor and an inner conductor; and

the surface wave plasma generating antenna, for radiating the microwave transmitted through the waveguide into the chamber, described in claim 1.

11. The surface wave plasma generating apparatus of claim 10, wherein

the microwave introducing mechanism further includes a tuner, provided in the waveguide, for matching an impedance of a load in the chamber to a characteristic impedance of the microwave power supply.

12. The surface wave plasma generating apparatus of claim 10, wherein the microwave introducing mechanism is provided in plural numbers.

13. The surface wave plasma generating apparatus of claim 11, wherein the microwave introducing mechanism is provided in plural numbers.

14. The surface wave plasma generating antenna of claim 2, wherein the first and the second end portion of each of the curved slots have a circular arc shape.