Layered system for producing a solar cell on a metal substrate, method for producing said layered system

• US 8,945,972 B2
• Filed: 02/10/2011
• Issued: 02/03/2015
• Est. Priority Date: 02/10/2010
• Status: Expired due to Fees

• Current Assignee: Tata Steel Nederland Technology BV (TATA Steel Limited)
• Original Assignee: Tata Steel Nederland Technology BV (TATA Steel Limited)
• Inventors: Palaniswamy, Ganesan, Van Krevel, Joost Willem Hendrik, Wigchert, Albertus Johannes Maria
• Primary Examiner(s): Mandala, Michelle
• Application Number:
  US13/577,410
• Publication Number:
  US 20120298198A1
• Time in Patent Office: 1,454 Days
• Field of Search: 438/71, 438/780, 257/E31.13
• US Class Current: 438/71
• CPC Class Codes: H01L 31/0236 Special surface textures
• CPC Class Codes: H01L 31/03921 including only elements of Group IV of the Periodic Table
• CPC Class Codes: H01L 31/056 the light-reflecting means being of the back surface reflector [BSR] type
• CPC Class Codes: H01L 31/072 the potential barriers being only of the PN heterojunction type
• CPC Class Codes: H01L 31/075 the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
• CPC Class Codes: H10K 30/87 Light-trapping means
• CPC Class Codes: H10K 71/821 Patterning of a layer by embossing, e.g. stamping to form trenches in an insulating layer
• CPC Class Codes: Y02E 10/52 PV systems with concentrators
• CPC Class Codes: Y02E 10/548 Amorphous silicon PV cells
• CPC Class Codes: Y02E 10/549 Organic PV cells

Abstract

The invention relates to a layered system for producing a solar cell on a metal substrate and to a method of producing the layered system.

Claims

1. A method of producing a layered system for use in a solar cell comprising the subsequent steps of:

(a) providing a mild steel substrate with a protective coating layer and with a polymer coating layer wherein the polymer coating layer comprises a crystallisable polymer selected from at least one member of the group consisting of polyesters, polyolefins, and polyamides;

(b) embossing the polymer coating layer to obtain a surface texture for light scattering, wherein the thermal embossing is applied at an embossing temperature of between 120-200°

C.;

(c) providing an adhesion layer on the embossed polymer coating layer and/or optionally pretreating the polymer coating layer to improve the adhesion;

(d) providing a solar cell back electrode following the shape of the embossed polymer coating layer or the adhesion layer, and having a light reflection coefficient sufficiently high for reflecting most of incoming light wherein the solar cell back electrode is a metal layer having a thickness of between 0.1 and 0.6 μ

m;

(e) providing one or more photovoltaic active layers capable to effectively transform light into electricity, wherein the photovoltaic active layer(s) comprise(s)

thin film of photovoltaic active silicon, or

thin film based on photovoltaic active organic molecules, or

polymer or hybrid based active donor-acceptor layers system combined with hole conducting and exciton blocking layers; and

(f) providing a transparent top electrode,

wherein

(i) the embossing of the polymer coating layer is brought about by thermal embossing a surface texture thereby at least partly crystallising the polymer coating layer, or

(ii) before the embossing the polymer coating layer which is at least partially crystallised is coated with a thixotropic coating composition or a sol/gel based composition as a second coating, which second coating is subsequently at most partially cured, then embossed to obtain a surface texture for light scattering, and then finish cured, or

(iii) before the embossing the polymer coating layer is coated with a thixotropic coating composition or a sol/gel based composition as a second coating, which second coating is subsequently at most partially cured, then embossed to obtain a surface texture for light scattering, and then finish cured, wherein the polymer coating layer at least partly recrystallises during curing.

2. The method according to claim 1, wherein the mild steel substrate is provided with protective coating layer of a nickel or chromium or cobalt or molybdenum and their alloys based plating layer, or a combination thereof, or with a chromium-oxide layer, or wherein the mild steel substrate is a galvanised steel.

3. The method according to claim 1, wherein the embossed polymer coating layer is provided with the adhesion layer.

4. The method according to claim 3, wherein the adhesion layer is a chromium oxide layer or an aluminium layer.

5. The method according to claim 1, wherein an additional scattering layer is provided on the back electrode, and which has a refractive index between that of the back electrode and the photovoltaic active layer, and wherein the scattering layer is optionally provided with a silicon-oxide nanolayer or a hole conducting or exciton blocking layer.

6. The method according to claim 1, wherein the polymer coating layer comprises said crystallisable polymer selected from at least one member of the group consisting of polyesters.

7. The method according to claim 1, wherein the polymer coating layer comprises said crystallisable polymer selected from at least one polyester selected from the group consisting of polyethylene terephthalate, polybutylene terephthalate or copolymers or blends thereof.

8. The method according to claim 1, wherein the protective coating of the mild steel strip is a corrosion protection coating and wherein the crystallisable polymer consists essentially of poly-ethylene terephthalate.

9. The method according to claim 1, wherein the embossing of the polymer coating layer is brought about by thermal embossing the surface texture thereby at least partly crystallising the polymer coating layer, wherein the thermal embossing is applied at the embossing temperature of between 120-200°

C., wherein the polymer of the polymer layer consists of at least one member of the group consisting of polyesters, polyolefins, and polyamides.

10. The method according to claim 1, wherein before the embossing the substrate is provided with the polymer coating layer which is at least partially crystallised, followed by the coating of the coated substrate with the second coating, which second coating is subsequently at most partially cured, embossed to obtain the surface texture for light scattering, and then finish cured.

11. The method according to claim 1, having at least one feature selected from the group consisting of:

the adhesion layer is a chromium oxide layer or an aluminium layer,

the back electrode is a silver or aluminium layer

an additional scattering layer is provided on the back electrode, and which has a refractive index between that of the back electrode and the one or more photovoltaic active layers, and wherein the scattering layer is optionally provided with a silicon-oxide nanolayer,

the photovoltaic active layer(s) comprise(s) thin film of photovoltaic active silicon, or thin film based on photovoltaic active organic molecules or polymer or hybrid based active donor-acceptor layers system combined with hole conducting and exciton blocking layers,

the thermally embossed polymer coating layer provides a holographic effect.

12. The method according to claim 1, wherein the wherein before the embossing the polymer coating layer is coated with the thixotropic coating composition or the sol/gel based composition as the second coating, which second coating is subsequently at most partially cured, then embossed to obtain the surface texture for light scattering, and then finish cured, wherein the polymer coating layer at least partly recrystallises during curing.

13. The method according to claim 1, wherein the embossing brings about a holographic image for counterfeit prevention, brand promotion and/or product authentication.

14. The method according to claim 1, wherein the polymer coating layer comprises at least one said crystallisable polymer selected from the group consisting of:

said polyesters selected from polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate or copolymers or blends thereof,

said polyolefins selected from polypropylene, biaxially oriented polypropylene or polyethylene, or

said polyamide.

15. The method according to claim 1, wherein the back electrode metal layer is a silver or aluminium layer.

16. The method according to claim 5, wherein the scattering layer is a transparent conductive oxide.

17. The method according to claim 16, wherein the transparent conductive oxide is selected from the group consisting of ZnO:

Al, SnO₂;

F or Indium Tin oxide (ITO).

18. The method according to claim 5, wherein the scattering layer is provided with the silicon-oxide nanolayer.

19. The method according to claim 5, wherein the scattering layer is provided with the hole conducting or exciton blocking layer.

20. The method according to claim 1, having at least one feature selected from the group consisting of:

the adhesion layer is a chromium oxide layer or an aluminium layer,

the metal layer is a silver or aluminium layer,

an additional scattering layer is provided on the back electrode, and which has a refractive index between that of the back electrode and the photovoltaic active layer, and wherein the scattering layer is a transparent conductive oxide selected from the group consisting of ZnO;

Al, SnO₂;

F or Indium Tin oxide (ITO), and wherein the scattering layer is optionally provided with a silicon-oxide nanolayer,

the photovoltaic active layer(s) comprise(s) thin film of photovoltaic active silicon, or thin film based on photovoltaic active organic molecules or polymer or hybrid based active donor-acceptor layers system combined with hole conducting and exciton blocking layers,

the thermally embossed polymer coating layer provides a holographic effect.

21. The method according to claim 1, wherein the polymer coating layer consists of polyethylene terephthalate (PET).

22. The method according to claim 1, wherein an additional scattering layer is provided on the back electrode, and which has a refractive index between that of the back electrode and the photovoltaic active layer, and wherein the scattering layer is a transparent conductive oxide selected from the group consisting of aluminium doped zinc oxide, fluorine-doped tin oxide or indium tin oxide;

and

the back electrode metal layer is a silver or aluminium layer,

wherein the polymer coating layer comprises at least one said crystallisable polymer selected from the group consisting of said polyesters selected from polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate or copolymers or blends thereof, said polyolefins selected from polypropylene, biaxially oriented polypropylene or polyethylene.

23. The method according to claim 1, wherein the polymer coating layer comprises at least one said crystallisable polymer selected from the group consisting of said polyesters selected from polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate or copolymers or blends thereof, said polyolefins selected from polypropylene, biaxially oriented polypropylene or polyethylene, wherein the thermal embossing is applied at an embossing temperature of between 120-150°

C. and the substrate has a thickness of between 0.05 and 1 mm, wherein the embossing of the polymer coating layer is brought about by thermal embossing the surface texture thereby at least partly crystallising the polymer coating layer.