Semiconductor package with through silicon vias

• US 8,946,742 B2
• Filed: 10/04/2010
• Issued: 02/03/2015
• Est. Priority Date: 04/05/2010
• Status: Active Grant

• Current Assignee: Epistar Corporation (Ennostar, Inc.)
• Original Assignee: TSMC Solid State Lighting Ltd. (Ennostar, Inc.)
• Inventors: Yu, Chen-Hua, Chang, Hung-Pin, Lin, Yung-Chi, Yu, Chia-Lin, Hung, Jui-Pin, Hwang, Chien Ling
• Primary Examiner(s): Nguyen, Khiem D
• Application Number:
  US12/897,124
• Publication Number:
  US 20110241040A1
• Time in Patent Office: 1,583 Days
• Field of Search: 438/629, 438/637, 438/653, 438/667, 438/29, 257/91, 257/751, 257/E23.161, 257/E33.065, 257/E21.584, 257/E21.585, 257/698, 257/774, 257/E23.011, 257/E21.597, 257/95, 257/98, 257/99, 257/100
• US Class Current: 257/98
• CPC Class Codes: H01L 21/3065 Plasma etching; Reactive-ion etching
• CPC Class Codes: H01L 21/486 Via connections through the substrate with or without pins
• CPC Class Codes: H01L 21/6835 using temporarily an auxiliary support
• CPC Class Codes: H01L 21/76843 formed in openings in a dielectric
• CPC Class Codes: H01L 21/76876 for deposition from the gas phase, e.g. CVD
• CPC Class Codes: H01L 21/76877 Filling of holes, grooves or trenches, e.g. vias, with conductive material
• CPC Class Codes: H01L 21/76879 by selective deposition of conductive material in the vias, e.g. selective C.V.D. on semiconductor material, plating plating on semiconductors in general H01L21/288
• CPC Class Codes: H01L 21/76898 formed through a semiconductor substrate
• CPC Class Codes: H01L 2221/68345 used as a support during the manufacture of self supporting substrates
• CPC Class Codes: H01L 2221/68359 used as a support during manufacture of interconnect decals or build up layers
• CPC Class Codes: H01L 2224/16 of an individual bump connector
• CPC Class Codes: H01L 2224/32225 the item being non-metallic, e.g. insulating substrate with or without metallisation
• CPC Class Codes: H01L 2224/32506 comprising an eutectic alloy
• CPC Class Codes: H01L 2224/45015 being circular
• CPC Class Codes: H01L 2224/45099 Material
• CPC Class Codes: H01L 2224/48091 Arched
• CPC Class Codes: H01L 2224/48227 connecting the wire to a bond pad of the item
• CPC Class Codes: H01L 2224/48233 connecting the wire to a potential ring of the item
• CPC Class Codes: H01L 2224/49113 the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
• CPC Class Codes: H01L 2224/73265 Layer and wire connectors
• CPC Class Codes: H01L 2224/97 : the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
• CPC Class Codes: H01L 23/147 : Semiconductor insulating substrates semiconductor conductive substrates H01L23/4926
• CPC Class Codes: H01L 23/481 : Internal lead connections, e.g. via connections, feedthrough structures
• CPC Class Codes: H01L 23/49827 : Via connections through the substrates, e.g. pins going through the substrate, coaxial cables H01L23/49822, H01L23/49833, H01L23/4985, H01L23/49861 take precedence
• CPC Class Codes: H01L 24/29 : of an individual layer connector
• CPC Class Codes: H01L 24/48 : of an individual wire connector
• CPC Class Codes: H01L 24/49 : of a plurality of wire connectors
• CPC Class Codes: H01L 24/97 : the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
• CPC Class Codes: H01L 2924/00 : Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/00012 : Relevant to the scope of the group, the symbol of which is combined with the symbol of this group
• CPC Class Codes: H01L 2924/00014 : the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
• CPC Class Codes: H01L 2924/01019 : Potassium [K]
• CPC Class Codes: H01L 2924/01029 : Copper [Cu]
• CPC Class Codes: H01L 2924/01078 : Platinum [Pt]
• CPC Class Codes: H01L 2924/01079 : Gold [Au]
• CPC Class Codes: H01L 2924/01322 : Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
• CPC Class Codes: H01L 2924/04941 : TiN
• CPC Class Codes: H01L 2924/12041 : LED
• CPC Class Codes: H01L 2924/14 : Integrated circuits
• CPC Class Codes: H01L 2924/181 : Encapsulation
• CPC Class Codes: H01L 2924/19041 : being a capacitor
• CPC Class Codes: H01L 2924/207 : Diameter ranges
• CPC Class Codes: H01L 2924/3512 : Cracking
• CPC Class Codes: H01L 2933/0066 : relating to arrangements for conducting electric current to or from the semiconductor body
• CPC Class Codes: H01L 33/005 : Processes
• CPC Class Codes: H01L 33/0054 : for devices with an active region comprising only group IV elements
• CPC Class Codes: H01L 33/486 : adapted for surface mounting
• CPC Class Codes: H01L 33/62 : Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
• CPC Class Codes: H01L 33/641 : characterized by the materials
• CPC Class Codes: H01L 33/644 : in intimate contact or integrated with parts of the device other than the semiconductor body
• CPC Class Codes: H01L 33/647 : the elements conducting electric current to or from the semiconductor body

Abstract

The substrate with through silicon plugs (or vias) described above removes the need for conductive bumps. The process flow is very simple and cost efficient. The structures described combines the separate TSV, redistribution layer, and conductive bump structures into a single structure. By combining the separate structures, a low resistance electrical connection with high heat dissipation capability is created. In addition, the substrate with through silicon plugs (or vias, or trenches) also allows multiple chips to be packaged together. A through silicon trench can surround the one or more chips to provide protection against copper diffusing to neighboring devices during manufacturing. In addition, multiple chips with similar or different functions can be integrated on the TSV substrate. Through silicon plugs with different patterns can be used under a semiconductor chip(s) to improve heat dissipation and to resolve manufacturing concerns.

Claims

1. A semiconductor device package, comprising:

a substrate with through silicon plugs extending from a first surface of the substrate to a second surface opposite to the first surface, wherein the substrate is a silicon substrate or a silicon-on-insulator (SOI) substrate, and wherein sidewalls of the one or more through silicon plugs are lined with an isolation layer and a first copper barrier layer, and wherein the through silicon plugs are filled with a first copper layer, wherein the through silicon plugs have first ends and second ends;

a first conductive contact pad formed over one or more of the first ends of a first subset of the through silicon plugs, wherein the first subset of the through silicon plugs include a plurality of through silicon plugs;

a second conductive contact pad formed over one or more of the first ends of a second subset of the through silicon plugs, wherein the second conductive contact pad is separated from the first conductive contact pad by a gap;

a semiconductor chip disposed on the first conductive contact pad, wherein the semiconductor chip is coupled to the second conductive contact pad by a bond wire, and wherein a substantial entirety of a surface of the semiconductor chip is in contact with the first conductive contact pad; and

a molding material disposed over the first conductive contact pad, the second conductive contact pad, and the semiconductor chip, wherein the molding material is free of being laterally confined, and wherein both sidewall surfaces of the first and second conductive contact pads are covered by the molding material.

2. The package of claim 1, wherein a height of the through silicon plugs is between about 20μ

m to about 200μ

m, and wherein a width of the through silicon vias is between about 10μ

m to about 100μ

m, and wherein the first conductive contact pad has a greater lateral dimension than the semiconductor chip.

3. The package of claim 1, wherein the substrate contains electrical circuitry therein, the electrical circuitry including at least one of:

transistors, capacitors, resistors, diodes, and fuses.

4. The package of claim 1, further comprising a second copper barrier layer separating the first copper layer on the first ends of the through silicon plugs and the first and second conductive contact pads, and wherein the first and second copper barrier layers are made of one or more materials selected from a group consisting of Ti, TiN, Ta, TaN, CoW, and a combination of the above mentioned films.

5. The package of claim 1, wherein the first and second conductive contact pads each comprises a second copper layer, a eutectic bonding layer and a copper diffusion barrier layer, and wherein the copper diffusion barrier layer is in direct contact with the second copper layer, and wherein the eutectic bonding layer is in direct contact with the semiconductor chip.

6. The package of claim 1, wherein the semiconductor chip is a light-emitting device (LED).

7. The package of claim 1, wherein one of the through silicon plugs is shaped as a trench surrounding the semiconductor chip and through silicon plugs disposed under the semiconductor chip, and wherein the first barrier layer in the trench protects against copper diffusion from through silicon plugs encircled by the trench.

8. The package of claim 1, wherein one of the through silicon plugs is shaped as a circular trench or a rectangular trench with rounded corners.

9. The package of claim 1, wherein there is one or more of the through silicon plugs under the semiconductor device, and wherein the one or more through silicon plugs have a cross section selected from a group consisting of a single circle, multiple circles, a single rectangle, multiple rectangles, a single pattern with at least 4corners, and multiple patterns with at least 4corners on one of the multiple patterns.

10. A semiconductor device package, comprising:

at least three light-emitting devices (LEDs), wherein the at least three LEDs emit light with more than one wavelengths;

a substrate with one or more through silicon plugs extending from a first surface of the substrate to a second surface opposite to the first surface, wherein sidewalls of the one or more through silicon plugs are lined with an isolation layer and a first copper barrier layer, and wherein the one or more through silicon plugs are filled with a first copper layer, wherein the one or more through silicon plugs have first ends and second ends, and wherein the second ends have the first copper layer extended above the first surface of the substrate and the first ends have the first copper layer flushed with the second surface of the substrate;

a second copper layer formed on the first ends of through silicon plugs, wherein the second copper layer defines an area to receive the at least three LEDs, wherein there is a second copper barrier layer separates the first copper layer on the first ends of the one or more through silicon plugs and the second copper layers, wherein the at least three LEDs are disposed on the area defined by the second copper layer; and

wherein one of the through silicon plugs is shaped as a trench surrounding the at least three LEDs and the through silicon plugs disposed under the at least three LEDs, and wherein the first barrier layer in the trench protects against copper diffusion from through silicon plugs encircled by the trench.

11. The package of claim 10, wherein there are 6LEDs on the package.

12. The package of claim 10, wherein the one of the through silicon plugs is shaped as a circular trench or a rectangular trench with rounded corners.

13. The package of claim 10, wherein there is one or more of the through silicon plugs under the at least three LEDs, and wherein the one or more through silicon plugs have a cross section selected from a group consisting of a single circle, multiple circles, a single rectangle, multiple rectangles, a single pattern with at least 4corners, and multiple patterns with at least 4corners on one of the multiple patterns.

14. A semiconductor package comprising:

a first substrate having a plurality of through-silicon plugs having first ends buried in the first substrate and bodies extending from a first side toward a second side of the first substrate, wherein the through-silicon plugs are lined with an isolation layer and a first copper barrier layer, and wherein the through-silicon plugs are filled with a first copper layer, and wherein the first substrate contains electrical circuitry therein, the electrical circuitry including at least one of;

transistors, capacitors, resistors, diodes, and fuses;

a plurality of areas of the first substrate devoid of silicon, the areas aligned with the first ends of the plurality of the through-silicon plugs buried in the first substrate, the areas including a second copper layer and a second copper barrier layer deposited on the first ends of through-silicon plugs, wherein the second copper layer includes a first conductive pad and a second conductive pad spaced apart from the first conductive pad;

a light-emitting diode (LED) chip directly bonded to the first conductive pad and wire bonded to the second conductive pad of the second copper layer, wherein the LED chip has a smaller lateral dimension than the second copper layer, and wherein a p-side of the LED chip is bonded to the first conductive pad, and wherein an n-side of the LED chip is wire bonded to the second conductive pad; and

a lens housing the semiconductor chip and the first conductive pad or the second conductive pad therein, wherein the lens is free of being circumferentially confined, and wherein the first and second conductive pads are disposed entirely within the lens housing.

15. The package of claim 14, further comprising:

a diffusion barrier layer deposited on the second copper layer after the second copper layer is formed;

a eutectic bonding layer deposited on the diffusion barrier layer.

16. The package of claim 14, wherein a height of the through silicon plugs is between about 20 microns to about 200 microns.

17. The package of claim 14, wherein the first and second copper barrier layers are made of one or more materials selected from a group consisting of Ti, TiN, Ta, TaN, CoW, and a combination of the above mentioned films.

18. The package of claim 14, wherein the first copper layer and the second copper layer are deposited by one or more copper plating processes, and wherein the second copper layer forms a thermal interface with a bottom area of the chip that consumes a substantial entirety of the bottom area.

19. The package of claim 14,

wherein the lens has a curved cross-sectional profile.

20. The package of claim 14, wherein the first substrate is one of:

a silicon substrate and a silicon-on-insulator (SOI) substrate.