Lithographic apparatus and device manufacturing method

• US 8,947,631 B2
• Filed: 05/26/2011
• Issued: 02/03/2015
• Est. Priority Date: 12/30/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Zaal, Koen Jacobus Johannes Maria, Ottens, Joost Jeroen
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/116,423
• Publication Number:
  US 20110222035A1
• Time in Patent Office: 1,349 Days
• Field of Search: 355/30, 355/53, 355/72, 250/548
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.

Claims

1. An apparatus, comprising:

a substrate table arranged to hold a substrate during exposure in an immersion lithographic apparatus; and

a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure, the cover plate configured to provide a surface, facing a projection system of the immersion lithographic apparatus, that is adjacent to and substantially level with the substrate, wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface.

2. The apparatus according to claim 1, further comprising the immersion lithographic apparatus, the immersion lithographic apparatus, comprising:

the projection system to project a modulated radiation beam onto the substrate, and

a liquid supply system to provide a liquid in a region between the projection system and the substrate during exposure.

3. The apparatus according to claim 1, wherein the reflective surface is a reflective coating.

4. The apparatus according to claim 1, wherein the cover plate has the reflective surface.

5. The apparatus according to claim 4, wherein the reflective surface of the cover plate faces the substrate table.

6. The apparatus according to claim 1, wherein there is a gap under the cover plate between the cover plate and the substrate table.

7. The apparatus according to claim 6, wherein the gap is between a plurality of protrusions of the cover plate, of the surface of the substrate table, or of both.

21. The apparatus according to claim 1, further comprising a plurality of protrusions of the substrate table to support the cover plate and a plurality of protrusions under the substrate when supported by the substrate table, a surface of the plurality of protrusions to support the cover plate and of the plurality of protrusions under the substrate forming a substantially flat plane.

8. A device manufacturing method, comprising:

projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table, the substrate table having a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure, and the cover plate providing a surface that is adjacent to and substantially level with a surface of the substrate onto which the modulated radiation beam is incident; and

reducing a heat transfer to or from the cover plate using a reflective surface of the cover plate, of a surface of the substrate table under the cover plate, or both.

9. The method according to claim 8, wherein the reflective surface is a reflective coating.

10. The method according to claim 8, wherein the cover plate has the reflective surface.

11. The method according to claim 10, wherein the reflective surface of the cover plate faces the substrate table.

12. The method according to claim 8, wherein there is a gap under the cover plate between the cover plate and the substrate table.

13. The method according to claim 8, wherein the gap is between a plurality of protrusions of the cover plate, of the surface of the substrate table, or of both.

14. An apparatus, comprising:

a substrate table to hold a substrate;

a projection system to project a modulated radiation beam onto the substrate;

a liquid supply system to provide a liquid in a region between the projection system and the substrate table during exposure; and

a cover plate physically separate and removable from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure and providing a surface facing the projection system that is substantially level with and adjacent to the substrate when supported by the substrate table;

a thermal insulator to reduce heat transfer to or from the cover plate,

wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface.

15. The apparatus according to claim 14, wherein the thermal insulator comprises the reflective surface on the cover plate.

16. The apparatus according to claim 15, wherein there is a gap under the cover plate between the cover plate and the substrate table.

17. The apparatus according to claim 14, wherein the thermal insulator comprises a plurality of protrusions.

18. The apparatus according to claim 17, wherein the protrusions are part of the substrate table.

19. The apparatus according to claim 14, further comprising a substrate holder, separate from the substrate table, to support the substrate, the substrate holder positioned between the substrate table and the substrate when supported by the substrate table.

20. The apparatus according to claim 14, further comprising a temperature sensor configured to measure the temperature of at least a portion of the cover plate.

22. An apparatus, comprising:

a substrate table arranged to hold a substrate;

a projection system to project a modulated radiation beam onto the substrate;

a liquid supply system to provide a liquid in a region between the projection system and the substrate table;

a cover plate physically separate and removable from the substrate table, the cover plate positioned outward of the substrate during exposure and the cover plate configured to provide a substantially horizontal surface adjacent to the substrate, wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface; and

a plurality of protrusions of the substrate table to support the cover plate.

23. The apparatus according to claim 22, further comprising a plurality of protrusions under the substrate when supported by the substrate table, a surface of the plurality of protrusions to support the cover plate and of the plurality of protrusions under the substrate forming a substantially flat plane.

24. An apparatus, comprising:

a movable table supporting an object;

a projection system to project a modulated radiation beam onto a substrate;

a liquid supply system to provide a liquid in a region between the projection system and the table;

a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the table and outward of the object during exposure, the cover plate configured to provide a substantially horizontal surface at least partly surrounding the object and having a reflective surface; and

a plurality of protrusions of the table to support the cover plate thereon.

25. The apparatus according to claim 24, wherein the object comprises the substrate and the cover plate has an aperture to surround the substrate.