Wafer-level solid state transducer packaging transducers including separators and associated systems and methods
First Claim
1. A method of forming solid-state transducers (SSTs), the method comprising:
- forming a transducer structure on a growth substrate, the transducer structure having a first surface opposite a second surface, wherein the second surface is proximate to the growth substrate;
forming a plurality of trenches extending through the transducer structure and at least partially through the growth substrate;
depositing a dielectric isolator and a metallic material sequentially in the trenches to form separators in the trenches that demarcate individual SSTs;
forming a support substrate over the first surface of the transducer structure and the separators; and
removing the growth substrate from the second surface of the transducer structure without exposing the metallic material and such that at least a portion of the separators remains, the separators forming a plurality of protrusions that extend beyond the second surface of the transducer structure, wherein individual protrusions include a portion of the dielectric isolator, and wherein the portion of the dielectric isolator covers the metallic material and extends beyond the metallic material and the second surface of the transducer structure,wherein removing the growth substrate includes—
planarizing the growth substrate to expose individual separators, andetching the growth substrate to further expose the individual separators.
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Accused Products
Abstract
Wafer-level packaging of solid-state transducers (“SSTs”) is disclosed herein. A method in accordance with a particular embodiment includes forming a transducer structure having a first surface and a second surface opposite the first surface, and forming a plurality of separators that extend from at least the first surface of the transducer structure to beyond the second surface. The separators can demarcate lateral dimensions of individual SSTs. The method can further include forming a support substrate on the first surface of the transducer structure, and forming a plurality of discrete optical elements on the second surface of the transducer structure. The separators can form barriers between the discrete optical elements. The method can still further include dicing the SSTs along the separators. Associated SST devices and systems are also disclosed herein.
31 Citations
29 Claims
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1. A method of forming solid-state transducers (SSTs), the method comprising:
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forming a transducer structure on a growth substrate, the transducer structure having a first surface opposite a second surface, wherein the second surface is proximate to the growth substrate; forming a plurality of trenches extending through the transducer structure and at least partially through the growth substrate; depositing a dielectric isolator and a metallic material sequentially in the trenches to form separators in the trenches that demarcate individual SSTs; forming a support substrate over the first surface of the transducer structure and the separators; and removing the growth substrate from the second surface of the transducer structure without exposing the metallic material and such that at least a portion of the separators remains, the separators forming a plurality of protrusions that extend beyond the second surface of the transducer structure, wherein individual protrusions include a portion of the dielectric isolator, and wherein the portion of the dielectric isolator covers the metallic material and extends beyond the metallic material and the second surface of the transducer structure, wherein removing the growth substrate includes— planarizing the growth substrate to expose individual separators, and etching the growth substrate to further expose the individual separators. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of forming solid-state transducers (SSTs), the method comprising:
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forming a transducer structure having a first surface and a second surface opposite the first surface; forming a plurality of separators that extend through the transducer structure, wherein the separators extend from at least the first surface of the transducer structure and project beyond the second surface into an underlying growth substrate, wherein individual separators include a metallic material and a dielectric material between the metallic material and the underlying growth substrate, and wherein the separators demarcate individual SSTs; planarizing the growth substrate to expose at least a portion of the dielectric material that extends beyond the second surface of the transducer structure; after planarizing the growth substrate, etching the growth substrate to further expose the dielectric material; forming a support substrate on the first surface of the transducer structure; measuring a performance parameter of each SST; forming discrete optical elements on the second surface of the transducer structure, wherein the separators form barriers between the discrete optical elements, and wherein each optical element is selected based on the measured performance parameter of the corresponding SST; and dicing the SSTs along the separators. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
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24. A method of forming solid-state transducers (SSTs), the method comprising:
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forming a transducer structure on a growth substrate, the transducer structure having a first surface opposite a second surface, wherein the second surface is proximate to the growth substrate; forming a plurality of trenches extending through the transducer structure and at least partially through the growth substrate; depositing a dielectric isolator and a metallic material sequentially in the trenches to form separators in the trenches that demarcate individual SSTs; forming a support substrate over the first surface of the transducer structure and the separators; and removing the growth substrate from the second surface of the transducer structure without exposing the metallic material and such that at least a portion of the separators remains, the separators forming a plurality of protrusions that extend beyond the second surface of the transducer structure, wherein individual protrusions include a portion of the dielectric isolator, and wherein the portion of the dielectric isolator covers the metallic material and extends beyond the metallic material and the second surface of the transducer structure, wherein removing the growth substrate includes— planarizing the growth substrate to at least partially expose the portion of the dielectric isolator; and etching the growth substrate to further expose the portion of the dielectric isolator.
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25. A method of forming solid-state transducers (SSTs), the method comprising:
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forming a transducer structure on a growth substrate, the transducer structure having a first surface opposite a second surface, wherein the second surface is proximate to the growth substrate; forming a plurality of trenches extending through the transducer structure and at least partially through the growth substrate; forming separators in the trenches that demarcate individual SSTs; forming a support substrate over the first surface of the transducer structure and the separators; planarizing the growth substrate to at least partially expose the separators; and after planarizing the growth substrate, etching the growth substrate to further expose the separators such that individual separators extend beyond the second surface of the transducer structure. - View Dependent Claims (26, 27, 28, 29)
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Specification