High performance surface mount electrical interconnect
First Claim
1. A method of forming an interconnect assembly comprising:
- forming a substrate with a plurality of through holes extending from a first major surface to a second major surface, each through holes comprising an axis and a cross-sectional area generally perpendicular to the axis;
forming a plurality of recesses in the second major surface of the substrate that at least partially overlap with the plurality of through holes, each recess comprising a recess axis and a recess cross-sectional area generally perpendicular to the recess axis, the recess cross-sectional area of the recess being greater than the cross-sectional area of the through holes;
inserting at least one discrete contact member in the plurality of the through holes, the contact members comprising proximal ends extending into the recesses, distal ends extending above the first major surface, and intermediate portions engaged with an engagement region of the substrate located between the first major surface and the recesses;
depositing retention members at least partially in the recesses; and
bonding the retention members to the proximal ends to retain the contact members in the through holes.
2 Assignments
0 Petitions
Accused Products
Abstract
A method of forming an interconnect assembly including forming a substrate with a plurality of through holes extending from a first major surface to a second major surface. A plurality of recesses are formed in the second major surface of the substrate that at least partially overlap with the plurality of through holes. The recesses have a cross-sectional area greater than a cross-sectional area of the through holes. At least one discrete contact member is inserted in a plurality of the through holes. The contact members include proximal ends extending into the recesses, distal ends extending above the first major surface, and intermediate portions engaged with an engagement region of the substrate located between the first major surface and the recesses. Retention members at least partially deposited in the recesses bond to the proximal ends to retain the contact members in the through holes.
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Citations
14 Claims
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1. A method of forming an interconnect assembly comprising:
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forming a substrate with a plurality of through holes extending from a first major surface to a second major surface, each through holes comprising an axis and a cross-sectional area generally perpendicular to the axis; forming a plurality of recesses in the second major surface of the substrate that at least partially overlap with the plurality of through holes, each recess comprising a recess axis and a recess cross-sectional area generally perpendicular to the recess axis, the recess cross-sectional area of the recess being greater than the cross-sectional area of the through holes; inserting at least one discrete contact member in the plurality of the through holes, the contact members comprising proximal ends extending into the recesses, distal ends extending above the first major surface, and intermediate portions engaged with an engagement region of the substrate located between the first major surface and the recesses; depositing retention members at least partially in the recesses; and bonding the retention members to the proximal ends to retain the contact members in the through holes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification