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High performance surface mount electrical interconnect

  • US 8,955,215 B2
  • Filed: 05/25/2010
  • Issued: 02/17/2015
  • Est. Priority Date: 05/28/2009
  • Status: Active Grant
First Claim
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1. A method of forming an interconnect assembly comprising:

  • forming a substrate with a plurality of through holes extending from a first major surface to a second major surface, each through holes comprising an axis and a cross-sectional area generally perpendicular to the axis;

    forming a plurality of recesses in the second major surface of the substrate that at least partially overlap with the plurality of through holes, each recess comprising a recess axis and a recess cross-sectional area generally perpendicular to the recess axis, the recess cross-sectional area of the recess being greater than the cross-sectional area of the through holes;

    inserting at least one discrete contact member in the plurality of the through holes, the contact members comprising proximal ends extending into the recesses, distal ends extending above the first major surface, and intermediate portions engaged with an engagement region of the substrate located between the first major surface and the recesses;

    depositing retention members at least partially in the recesses; and

    bonding the retention members to the proximal ends to retain the contact members in the through holes.

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