Conductive multilayer stack, coated substrates including the same, and methods of making the same
First Claim
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1. An electrically conductive multilayer stack comprising:
- first and second metal oxide layers comprising a titanium oxide, the first metal oxide layer comprising a first region comprising a titanium oxide, a second region on the first region and comprising a titanium oxide, and a third region on the second region and comprising a titanium oxide, the first region and the third region each having a higher oxygen concentration than that of the second region, wherein;
the first region has a thickness in a range of about 0.5 to about 6 nm, and/orthe second region has a thickness in a range of about 3 to about 8 nm, and/orthe third region has a thickness in a range of about 0.5 to about 6 nm; and
a metal layer between the first and second metal oxide layers.
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Abstract
An electrically conductive multilayer stack including a first metal oxide layer including titanium oxide, a metal layer on the first metal oxide layer, and a second metal oxide layer including titanium oxide on the metal layer, at least one of the first metal oxide layer and the second metal oxide layer including a first region, a second region on the first region, and a third region on the second region, the first region and the third region each having a higher oxygen concentration than that of the second region is disclosed. Methods of manufacturing an electrically conductive multilayer stack are also disclosed.
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Citations
23 Claims
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1. An electrically conductive multilayer stack comprising:
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first and second metal oxide layers comprising a titanium oxide, the first metal oxide layer comprising a first region comprising a titanium oxide, a second region on the first region and comprising a titanium oxide, and a third region on the second region and comprising a titanium oxide, the first region and the third region each having a higher oxygen concentration than that of the second region, wherein; the first region has a thickness in a range of about 0.5 to about 6 nm, and/or the second region has a thickness in a range of about 3 to about 8 nm, and/or the third region has a thickness in a range of about 0.5 to about 6 nm; and a metal layer between the first and second metal oxide layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of manufacturing an electrically conductive multilayer stack, the method comprising:
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forming a first metal oxide layer comprising a titanium oxide; forming a metal layer on the first metal oxide layer; and forming a second metal oxide layer comprising a titanium oxide on the metal layer, at least one of the forming the first metal oxide layer or the forming the second metal oxide layer comprising varying a flow rate of oxygen to form a first region comprising a titanium oxide, a second region on the first region and comprising a titanium oxide, and a third region on the second region and comprising a titanium oxide, the first region and the third region each having a higher oxygen concentration than that of the second region, wherein; the first region has a thickness in a range of about 0.5 to about 6 nm, and/or the second region has a thickness in a range of about 3 to about 8 nm, and/or the third region has a thickness in a range of about 0.5 to about 6 nm. - View Dependent Claims (15, 16, 17, 18)
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19. A method of manufacturing an electrically conductive multilayer stack, the method comprising:
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forming a first metal oxide layer comprising titanium oxide; forming a metal layer on the first metal oxide layer; and forming a second metal oxide layer comprising titanium oxide on the metal layer, at least one of the forming the first metal oxide layer and the forming the second metal oxide layer comprising forming a first region comprising a titanium oxide, a second region comprising a titanium oxide and a third region comprising a titanium oxide, the first region and third region each having a higher oxygen concentration than the second region, wherein; the first region has a thickness in a range of about 0.5 to about 6 nm, and/or the second region has a thickness in a range of about 3 to about 8 nm, and/or the third region has a thickness in a range of about 0.5 to about 6 nm. - View Dependent Claims (20)
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21. An electrically conductive multilayer stack comprising:
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first and second metal oxide layers comprising a titanium oxide, the first metal oxide layer comprising a first region having a thickness in a range of about 0.5 to about 6 nm, a second region on the first region, and a third region on the second region, the first region and the third region each having a higher oxygen concentration than that of the second region; and a metal layer between the first and second metal oxide layers.
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22. An electrically conductive multilayer stack comprising:
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first and second metal oxide layers comprising a titanium oxide, the first metal oxide layer comprising a first region, a second region on the first region and having a thickness in a range of about 3 to about 8 nm, and a third region on the second region, the first region and the third region each having a higher oxygen concentration than that of the second region; and a metal layer between the first and second metal oxide layers.
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23. An electrically conductive multilayer stack comprising:
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first and second metal oxide layers comprising a titanium oxide, the first metal oxide layer comprising a first region, a second region on the first region, and a third region on the second region and having a thickness in a range of about 0.5 to about 6 nm, the first region and the third region each having a higher oxygen concentration than that of the second region; and a metal layer between the first and second metal oxide layers.
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Specification