Method of manufacturing photonic crystal and method of manufacturing surface-emitting laser
First Claim
1. A method of manufacturing a structure having periodically modulated refractive indices, the structure including a semiconductor layer in which at least one of pores and grooves are formed, the method comprising:
- a first step of forming, on a surface of a substrate, a protective mask having an opening pattern;
a second step of forming a semiconductor layer on a top surface of the protective mask and an exposed portion of the surface of the substrate, which is exposed through the opening pattern of the protective mask, and embedding the protective mask;
a third step of forming the at least one of pores and grooves in the semiconductor layer so that the at least one of pores and grooves at least partly overlap the semiconductor layer formed on the exposed portion of the surface of the substrate as seen from a direction perpendicular to the surface of the substrate;
a fourth step of removing at least a part of the semiconductor layer formed on the exposed portion of the surface of the substrate; and
a fifth step of removing at least a part of the protective mask.
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Accused Products
Abstract
Provided is a method of manufacturing a photonic crystal, including: a first step of forming, on a surface of a substrate, a protective mask for selective growth, the protective mask having an opening pattern opened therein; a second step of selectively growing a columnar semiconductor from an exposed portion of the surface of the substrate not having the mask formed thereon, laterally overgrowing the semiconductor layer on the mask, and embedding the mask; a third step of forming a photonic crystal in the semiconductor layer so that openings in the opening pattern and the one of pores and grooves which form the photonic crystal are at least partly overlapped each other when seen from a direction perpendicular to the surface of the substrate; a fourth step of removing at least part of the columnar semiconductor; and a fifth step of removing at least part of the mask.
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Citations
20 Claims
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1. A method of manufacturing a structure having periodically modulated refractive indices, the structure including a semiconductor layer in which at least one of pores and grooves are formed, the method comprising:
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a first step of forming, on a surface of a substrate, a protective mask having an opening pattern; a second step of forming a semiconductor layer on a top surface of the protective mask and an exposed portion of the surface of the substrate, which is exposed through the opening pattern of the protective mask, and embedding the protective mask; a third step of forming the at least one of pores and grooves in the semiconductor layer so that the at least one of pores and grooves at least partly overlap the semiconductor layer formed on the exposed portion of the surface of the substrate as seen from a direction perpendicular to the surface of the substrate; a fourth step of removing at least a part of the semiconductor layer formed on the exposed portion of the surface of the substrate; and a fifth step of removing at least a part of the protective mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification