Semiconductor device having an airbridge and method of fabricating the same
First Claim
1. A method of forming a device having an airbridge on a substrate, the method comprising:
- forming a plated conductive layer of the airbridge over at least a photoresist layer on a portion of the substrate, the plated conductive layer defining a corresponding opening for exposing a portion of the photoresist layer;
undercutting the photoresist layer to form a gap in the photoresist layer beneath the plated conductive layer at the opening;
forming an adhesion layer on the plated conductive layer and the exposed portion of the photoresist layer, the adhesion layer having a break at a gap beneath the plated conductive layer;
removing the photoresist layer and a portion of the adhesion layer formed on the exposed portion of the photoresist layer, the removing comprising etching the photoresist layer through the break in the adhesion layer; and
forming an insulating layer on at least the adhesion layer, which enhances adhesion of the insulating layer to the plated conductive layer.
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Accused Products
Abstract
A method of forming a device having an airbridge on a substrate includes forming a plated conductive layer of the airbridge over at least a photoresist layer on a portion of the substrate, the plated conductive layer defining a corresponding opening for exposing a portion of the photoresist layer. The method further includes undercutting the photoresist layer to form a gap in the photoresist layer beneath the plated conductive layer at the opening, and forming an adhesion layer on the plated conductive layer and the exposed portion of the photoresist layer, the adhesion layer having a break at the gap beneath the plated conductive layer. The photoresist layer and a portion of the adhesion layer formed on the exposed portion of the photoresist layer is removed, which includes etching the photoresist layer through the break in the adhesion layer. An insulating layer is formed on at least the adhesion layer, enhancing adhesion of the insulating layer to the plated conductive layer.
454 Citations
12 Claims
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1. A method of forming a device having an airbridge on a substrate, the method comprising:
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forming a plated conductive layer of the airbridge over at least a photoresist layer on a portion of the substrate, the plated conductive layer defining a corresponding opening for exposing a portion of the photoresist layer; undercutting the photoresist layer to form a gap in the photoresist layer beneath the plated conductive layer at the opening; forming an adhesion layer on the plated conductive layer and the exposed portion of the photoresist layer, the adhesion layer having a break at a gap beneath the plated conductive layer; removing the photoresist layer and a portion of the adhesion layer formed on the exposed portion of the photoresist layer, the removing comprising etching the photoresist layer through the break in the adhesion layer; and forming an insulating layer on at least the adhesion layer, which enhances adhesion of the insulating layer to the plated conductive layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification