CMP pad dresser having leveled tips and associated methods

• US 8,974,270 B2
• Filed: 05/23/2012
• Issued: 03/10/2015
• Est. Priority Date: 05/23/2011
• Status: Active Grant

• Current Assignee: Chien-Min Sung
• Original Assignee: Kinik Company
• Inventors: Sung, Chien-Min
• Primary Examiner(s): NGUYEN, GEORGE BINH MINH
• Application Number:
  US13/479,148
• Publication Number:
  US 20120302146A1
• Time in Patent Office: 1,021 Days
• Field of Search: 451/443, 451/444, 451/548, 451/56, 512/95, 513/09
• US Class Current: 451/443
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: B24B 53/12 Dressing tools; Holders therefor
• CPC Class Codes: B24D 3/06 metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
• CPC Class Codes: B24D 7/00 Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
• CPC Class Codes: H01L 21/304 Mechanical treatment, e.g. grinding, polishing, cutting H01L21/30625 takes precedence
• CPC Class Codes: Y10T 428/24372 Particulate matter

Abstract

CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a matrix layer and a monolayer of a plurality of superabrasive particles embedded in the matrix layer, where each superabrasive particle in the monolayer protrudes from the matrix layer. The difference in the protrusion distance between the highest protruding tip and the next highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 20 microns, and the difference in protrusion distance between the highest 1% of the protruding tips of the monolayer of superabrasive particles are within about 80 microns or less.

Claims

1. A CMP pad dresser, comprising:

a first monolayer of superabrasive particles disposed on and protruding from one side of a metal support layer, wherein the difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 50 microns;

a second monolayer of superabrasive particles disposed on the metal support layer on an opposite side from the first monolayer, wherein the superabrasive particles of the second monolayer are positioned to have substantially the same distribution as the superabrasive particles of the first monolayer; and

a rigid support coupled to the second monolayer of superabrasive particles opposite the first monolayer.

2. The dresser of claim 1, wherein the plurality of superabrasive particles are arranged in at least one annular configuration having a central region devoid of superabrasive particles.

3. The dresser claim 1, wherein the plurality of superabrasive particles are configured in an attitude having a sharp portion oriented towards a pad to be dressed.

4. The dresser of claim 1, wherein the plurality of superabrasive particles are substantially all configured in an attitude having either an apex or an edge portion oriented toward a pad to be dressed.

5. The dresser of claim 1, wherein the difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the first monolayer of superabrasive particles is less than or equal to about 10 microns.

6. The dresser of claim 5, wherein the difference in protrusion distance between the highest protruding tip and the 10^th highest protruding tip of the first monolayer of superabrasive particles is less than or equal to about 20 microns.

7. The dresser of claim 6, wherein the difference in protrusion distance between the highest protruding tip and the 100^th highest protruding tip of the first monolayer of superabrasive particles is less than or equal to about 40 microns.

8. The dresser of claim 1, wherein the difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the first monolayer of superabrasive particles is less than or equal to about 20 microns.