Lithographic apparatus and method
First Claim
1. A lithographic method, the method comprising:
- using information at least indicative of a target shape or size of a constituent part of a device to implement the target shape or size of the constituent part of the device, the target shape or size being calculated from a measured materials property of a material of a layer in which the constituent part of the device is to be created and/or of a previous device, and at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements to create in a radiation beam a pattern which is sufficient to implement the target shape or size of the constituent part of the device when creating the constituent part of the device.
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Abstract
A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device.
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Citations
20 Claims
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1. A lithographic method, the method comprising:
using information at least indicative of a target shape or size of a constituent part of a device to implement the target shape or size of the constituent part of the device, the target shape or size being calculated from a measured materials property of a material of a layer in which the constituent part of the device is to be created and/or of a previous device, and at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements to create in a radiation beam a pattern which is sufficient to implement the target shape or size of the constituent part of the device when creating the constituent part of the device. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A lithographic apparatus, comprising:
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a plurality of individually controllable elements, configured to create a pattern in a radiation beam; a projection system, configured to project the patterned radiation beam onto a substrate; and a control arrangement, the control arrangement configured to use information at least indicative of a target shape or size of a constituent part of a device to implement the target shape or size of the constituent part of the device, the target shape or size being calculated from a measured materials property of a material of a layer in which the constituent part of the device is to be created and/or of a previous device, and at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements to create in a radiation beam a pattern which is sufficient to implement the target shape or size of the constituent part of the device when creating the constituent part of the device. - View Dependent Claims (9, 10)
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11. A lithographic method, the method comprising:
using information at least indicative of a target change in the shape or size of a constituent part of a first device to implement the change in the shape or size of a constituent part of a subsequently created second device to vary the shape or size of that constituent part from the design shape or size of that constituent part such that the processed shape or size of the constituent part of the subsequently created second device is different from the design processed shape or size of that constituent part, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements of a lithographic apparatus to create in a radiation beam a pattern which is sufficient to implement the change in the shape or size of the constituent part of the subsequently created second device. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A lithographic apparatus, the lithographic apparatus comprising
a plurality of individually controllable elements, configured to create a pattern in a radiation beam; -
a projection system, configured to project the patterned radiation beam onto a substrate; and a control arrangement, the control arrangement being configured to use information at least indicative of a target change in the shape or size of a constituent part of a first device to implement the change in the shape or size of a constituent part of a subsequently created second device to vary the shape or size of that constituent part from the design shape or size of that constituent part such that the processed shape or size of the constituent part of the subsequently created second device is different from the design processed shape or size of that constituent part, at least a part of the implementation comprising determining a configuration of the plurality of individually controllable elements to create in the radiation beam a pattern which is sufficient to implement the target change in the shape or size of the constituent part of the subsequently created second device. - View Dependent Claims (18)
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19. A lithographic apparatus, comprising:
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a plurality of individually controllable elements, configured to create a pattern in a radiation beam; a projection system, configured to project the patterned radiation beam onto a substrate; and a control arrangement, the control arrangement configured to use information at least indicative of a target shape or size of a constituent part of a device to implement the target shape or size of the constituent part of the device, the target shape or size being calculated using a measured electrical or chemical property of a material of a layer in which the constituent part of the device is to be created and/or a measured electrical or chemical property of a material of a previous device, and at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements to create in a radiation beam a pattern which is sufficient to implement the target shape or size of the constituent part of the device when creating the constituent part of the device. - View Dependent Claims (20)
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Specification