Polarization designs for lithographic apparatus
First Claim
1. A method of improving a transfer of an image of a patterning device layout onto a substrate with a lithographic apparatus, the method comprising:
- performing a first process corresponding to each of a plurality of predefined polarization conditions to select a predefined polarization condition that results in a lithographic response value associated with relatively better reproduction of a critical feature; and
performing a second process to iteratively arrive at a desired spatially varying freeform polarization condition that results in a desired value of the lithographic response, wherein the second process uses one or more of the predefined polarization conditions used in the first process.
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Abstract
Improved low k1 lithographic imaging is disclosed by optimizing or improving an illumination polarization condition. The polarization condition may be a pre-defined spatially varying polarization, or a spatially customized local polarization of bright illumination points based on tracking a value of a desired lithographic response. Several non-traditional polarization conditions, e.g., TM/TE polarization (with or without a central TM region), diagonal polarization, and Y+X polarization (typically for dark field illumination) are disclosed, that offer substantial imaging advantages for specific lithographic problems, especially at low k1 values. The initial polarization definition may be limited to specific fixed polarization angles.
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Citations
20 Claims
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1. A method of improving a transfer of an image of a patterning device layout onto a substrate with a lithographic apparatus, the method comprising:
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performing a first process corresponding to each of a plurality of predefined polarization conditions to select a predefined polarization condition that results in a lithographic response value associated with relatively better reproduction of a critical feature; and performing a second process to iteratively arrive at a desired spatially varying freeform polarization condition that results in a desired value of the lithographic response, wherein the second process uses one or more of the predefined polarization conditions used in the first process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. A non-transitory computer storage product having machine executable instructions, the instructions being executable by a machine to perform a method of configuring a transfer of an image of a patterning device layout onto a substrate with a lithographic apparatus, the method comprising:
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performing a first process corresponding to each of a plurality of predefined polarization conditions to select a predefined polarization condition that result in a lithographic response value associated with relatively better reproduction of a critical feature; and performing a second process to iteratively arrive at a desired spatially varying freeform polarization condition that results in a desired value of the lithographic response, wherein the second process uses one or more of the predefined polarization conditions used in the first process.
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17. A device manufacturing method, comprising:
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projecting a patterned beam of radiation in a lithographic apparatus onto a radiation sensitive substrate, wherein the patterned beam has a TM/TE polarization condition that comprises; TM polarization along diagonals of a pupil plane of the lithographic apparatus, and TE polarization at each of the Cartesian axes of the pupil plane, wherein an effective polarization direction of substantially all the radiation between one Cartesian axis and one of the diagonals is rotated by less than 45 degrees going from the one Cartesian axis to the one of the diagonals and an effective polarization direction of substantially all the radiation between another Cartesian axis and the same one of the diagonals is rotated by less than 45 degrees going from the other Cartesian axis to the same one of the diagonals. - View Dependent Claims (18)
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19. A device manufacturing method, comprising:
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projecting a patterned beam of radiation in a lithographic apparatus onto a radiation sensitive substrate, wherein the patterned beam has a spatially varying polarization condition created by a transmissive polarization plate and/or a diffractive optical element and the spatially varying polarization condition has; a TM/TE polarization condition that comprises TM polarization along diagonals of a pupil plane of the lithographic apparatus and TE polarization in each quadrant of the pupil plane, and a central region of the pupil plane, within the TM/TE polarization condition, of linearly polarized radiation, substantially only TM radiation, or substantially only TE radiation. - View Dependent Claims (20)
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Specification