Method for manufacturing an opto-microelectronic device
First Claim
Patent Images
1. A method for manufacturing an opto-microelectronic device from a first semiconductor substrate, comprising the production of at least one electrode of a pixel after a transfer of the first semiconductor substrate onto a second substrate, the method comprising:
- a first phase carried out before the transfer and comprising;
i) forming at least one pattern made of a sacrificial material in a layer formed in the first substrate surface,ii) a lateral delimitation of the at least one pattern in the layer of the first substrate surface by an edge of a boundary material differing from the sacrificial material,a second phase carried out after the transfer and comprising a substitution of the electrode for the pattern including a removal of the sacrificial material of the pattern by a selective etching so configured as to attack the sacrificial material of the pattern and to preserve the boundary material without using photolithography.
1 Assignment
0 Petitions
Accused Products
Abstract
Method for manufacturing a microelectronic device from a first substrate (10), including the production of at least one electronic component in the semi-conductor substrate after transferring the first substrate (10) onto a second substrate (20), characterized in that it comprises:
- a first phase carried out prior to the transfer, and including forming at least one pattern made of a sacrificial material in a layer of the first substrate (10),
- a second phase carried out after the transfer and including the substitution of the electronic component for the pattern.
3 Citations
24 Claims
-
1. A method for manufacturing an opto-microelectronic device from a first semiconductor substrate, comprising the production of at least one electrode of a pixel after a transfer of the first semiconductor substrate onto a second substrate, the method comprising:
-
a first phase carried out before the transfer and comprising; i) forming at least one pattern made of a sacrificial material in a layer formed in the first substrate surface, ii) a lateral delimitation of the at least one pattern in the layer of the first substrate surface by an edge of a boundary material differing from the sacrificial material, a second phase carried out after the transfer and comprising a substitution of the electrode for the pattern including a removal of the sacrificial material of the pattern by a selective etching so configured as to attack the sacrificial material of the pattern and to preserve the boundary material without using photolithography. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
-
Specification