Cyclic amino compounds for low-k silylation
First Claim
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1. A method of repairing a dielectric film previously damaged by a processing step(s), the method comprising the step of:
- contacting the dielectric film with a repair agent having a formula R3SiL, wherein each R is independently selected from the group consisting of H, methyl, and ethyl;
L is a nitrogen-containing ring selected from the group consisting of 1,2,3-triazole, piperidine, 1-methylpiperazine, pyrolidine, and pyrazole; and
one nitrogen in the nitrogen-containing ring is bonded directly to the Si atom, whereby the dielectric film is completely or partially restored.
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Abstract
Disclosed herein are mono-functional silylating compounds that may exhibit enhanced silylating capabilities. Also disclosed are method of synthesizing and using these compounds. Finally methods to determine effective silylation are also disclosed.
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15 Claims
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1. A method of repairing a dielectric film previously damaged by a processing step(s), the method comprising the step of:
contacting the dielectric film with a repair agent having a formula R3SiL, wherein each R is independently selected from the group consisting of H, methyl, and ethyl;
L is a nitrogen-containing ring selected from the group consisting of 1,2,3-triazole, piperidine, 1-methylpiperazine, pyrolidine, and pyrazole; and
one nitrogen in the nitrogen-containing ring is bonded directly to the Si atom, whereby the dielectric film is completely or partially restored.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
Specification