Methods and systems for lithography calibration using a mathematical model for a lithographic process

• US 9,009,647 B2
• Filed: 04/08/2013
• Issued: 04/14/2015
• Est. Priority Date: 11/06/2008
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Ye, Jun, Cao, Yu, Feng, Hanying
• Primary Examiner(s): DO, THUAN V
• Application Number:
  US13/858,795
• Publication Number:
  US 20130232457A1
• Time in Patent Office: 736 Days
• Field of Search: 716/132
• US Class Current: 716/132
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 1/68 Preparation processes not covered by groups G03F1/20 - G03F1/50
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70516 Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
• CPC Class Codes: G06F 30/00 Computer-aided design [CAD]

Abstract

A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.

Claims

1. A calibration method implemented by a computer, the method comprising:

generating, using the computer, a model for a lithographic process, the model comprising a polynomial series expansion around a nominal value of a physical parameter of the lithographic process; and

fitting the model to measured dimensions of imaging results obtained by applying the lithographic process at a plurality of values of the physical parameter by optimizing at least one polynomial expansion coefficient.

2. The calibration method of claim 1, further comprising:

optimizing at least two polynomial expansion coefficients.

3. The calibration method according to claim 1, further comprising:

using weight factors for different values of the physical parameter.

4. The calibration method according to claim 1, further comprising:

generating differential transmission cross coefficients in a part of the model corresponding to an imaging process.

5. The calibration method according to claim 1, further comprising:

performing a further polynomial series expansion around a further nominal value of a further physical parameter of the lithographic process, wherein the imaging results are obtained at a plurality of values of the further physical parameter, and wherein fitting the model comprises optimizing at least one further polynomial expansion coefficient corresponding to the further polynomial series expansion.

6. The calibration method according to claim 5, comprising:

using weight factors for combinations of different values of the physical parameter and the further physical parameter.

7. The calibration method according to claim 1, further comprising:

determining a variation of a metric with variation of the parameter around the value of the nominal parameter using the model;

repeating the generating and fitting steps at a different value of the nominal parameter;

determining a further variation of a metric with variation of the parameter around the different value of the nominal parameter using the model; and

selecting a value for the physical parameter based on the variation of the value of the physical parameter and the further variation of the value of the physical parameter.

8. The calibration method of claim 1, wherein the physical parameter is related to one or more of an optical parameter and a resist parameter.

9. The calibration method of claim 1, wherein the imaging result is associated with one or both of an aerial image and a resist image.

10. The calibration method of claim 1, wherein the plurality of values of the physical parameter are selected within a process window.

11. The calibration method of claim 1, wherein the polynomial series expansion represents a combined model of the lithographic process including an optical model and a resist model.

12. The calibration method of claim 11, wherein the physical parameters of the lithographic process comprise linear parameters, non-linear parameters, or a combination thereof.

13. The calibration method of claim 11, wherein calibration of the lithographic process reduces to a linear problem by the polynomial series expansion even if one or more of the physical parameters of the lithographic process are non-linear.

14. A non-transitory computer-readable storage medium having computer-executable instructions stored therein for causing a computer to perform a calibration method, the method comprising:

generating, using the computer, a model for a lithographic process, the model comprising a polynomial series expansion around a nominal value of a physical parameter of the lithographic process; and

fitting the model to measured dimensions of imaging results obtained by applying the lithographic process at a plurality of values of the physical parameter by optimizing at least one polynomial expansion coefficient.

15. The computer-readable storage medium of claim 14, wherein the calibration method further comprises:

optimizing at least two polynomial expansion coefficients.

16. The computer-readable storage medium of claim 14, wherein the calibration method further comprises:

using weight factors for different values of the physical parameter.

17. The computer-readable storage medium of claim 14, wherein the calibration method further comprises:

generating differential transmission cross coefficients in a part of the model corresponding to an imaging process.

18. The computer-readable storage medium of claim 14, wherein the calibration method further comprises:

performing a further polynomial series expansion around a further nominal value of a further physical parameter of the lithographic process, wherein the imaging results are obtained at a plurality of values of the further physical parameter, and wherein fitting the model comprises optimizing at least one further polynomial expansion coefficient corresponding to the further polynomial series expansion.

19. The computer-readable storage medium of claim 18, wherein the calibration method further comprises:

using weight factors for combinations of different values of the physical parameter and the further physical parameter.

20. The computer-readable storage medium of claim 14, wherein the calibration method further comprises:

determining a variation of a metric with variation of the parameter around the value of the nominal parameter using the model;

repeating the generating and fitting steps at a different value of the nominal parameter;

determining a further variation of a metric with variation of the parameter around the different value of the nominal parameter using the model; and

selecting a value for the physical parameter based on the variation of the value of the physical parameter and the further variation of the value of the physical parameter.

21. The computer-readable storage medium of claim 14, wherein the physical parameter is related to one or more of an optical parameter and a resist parameter.

22. The computer-readable storage medium of claim 14, wherein the imaging result is associated with one or both of an aerial image and a resist image.

23. The computer-readable storage medium of claim 14, wherein the plurality of values of the physical parameter are selected within a process window.