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Device for measuring forces and method of making the same

  • US 9,010,200 B2
  • Filed: 08/06/2012
  • Issued: 04/21/2015
  • Est. Priority Date: 08/06/2012
  • Status: Expired due to Fees
First Claim
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1. A device for measuring forces, the device comprising:

  • a first wafer comprising a first buried oxide layer disposed between a first device layer and a second device layer;

    a second wafer joined to the first device layer by a second buried oxide layer;

    a diaphragm cavity extending from the second device layer, through the first device layer, the second buried oxide layer, and the second wafer, wherein the second device layer forms a diaphragm over the diaphragm cavity;

    a boss structure within the diaphragm cavity, the boss structure extending from the first buried oxide layer, the boss structure having substantially parallel sidewalls; and

    a first sensor in the second device layer proximate to the diaphragm to sense flexure in the diaphragm.

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