Reverse osmosis device

• US 9,011,682 B2
• Filed: 08/10/2011
• Issued: 04/21/2015
• Est. Priority Date: 08/27/2010
• Status: Expired due to Fees

• Current Assignee: Manfred Volker
• Original Assignee: Manfred Volker
• Inventors: Volker, Manfred
• Primary Examiner(s): Mellon, David C
• Application Number:
  US13/206,624
• Publication Number:
  US 20120048790A1
• Time in Patent Office: 1,350 Days
• US Class Current: 210/223
• CPC Class Codes: C02F 1/008 Control or steering systems not provided for elsewhere in subclass C02F
• CPC Class Codes: C02F 1/36 ultrasonic vibrations
• CPC Class Codes: C02F 1/385 by centrifuging suspensions centrifuges B04B
• CPC Class Codes: C02F 1/441 by reverse osmosis
• CPC Class Codes: C02F 1/4602 for prevention or elimination of deposits
• CPC Class Codes: C02F 1/4672 by electrooxydation
• CPC Class Codes: C02F 1/48 with magnetic or electric fields C02F1/46 takes precedence
• CPC Class Codes: C02F 1/481 using permanent magnets
• CPC Class Codes: C02F 1/484 using electromagnets
• CPC Class Codes: C02F 1/485 located on the outer wall of the treatment device, i.e. not in contact with the liquid to be treated, e.g. detachable
• CPC Class Codes: C02F 2001/46133 characterised by the material
• CPC Class Codes: C02F 2001/46152 characterised by the shape or form electrodes in particulate form or with conductive or non-conductive particles between them C02F1/46114
• CPC Class Codes: C02F 2103/026 Treating water for medical or cosmetic purposes
• CPC Class Codes: C02F 2103/04 for obtaining ultra-pure water
• CPC Class Codes: C02F 2201/003 Coaxial constructions, e.g. a cartridge located coaxially within another
• CPC Class Codes: C02F 2201/46115 Electrolytic cell with membranes or diaphragms
• CPC Class Codes: C02F 2201/46175 Electrical pulses
• CPC Class Codes: C02F 2209/008 comprising telecommunication features, e.g. modems or antennas
• CPC Class Codes: C02F 2209/04 Oxidation reduction potential [ORP]
• CPC Class Codes: C02F 2209/11 Turbidity
• CPC Class Codes: C02F 2301/026 : Spiral, helicoidal, radial
• CPC Class Codes: C02F 2301/046 : Recirculation with an external loop
• CPC Class Codes: C02F 2303/04 : Disinfection
• CPC Class Codes: C02F 2303/10 : Energy recovery
• CPC Class Codes: C02F 2303/16 : Regeneration of sorbents, filters
• CPC Class Codes: C02F 2303/20 : Prevention of biofouling
• CPC Class Codes: C02F 2303/22 : Eliminating or preventing deposits, scale removal, scale prevention C02F1/042, C02F1/4602, C02F5/00 take precedence
• CPC Class Codes: C02F 9/00 : Multistage treatment of water, waste water or sewage
• CPC Class Codes: Y02W 10/30 : Wastewater or sewage treatment systems using renewable energies

Abstract

The device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by the RO membrane into a primary circuit and into a secondary circuit, and a pump for the primary circuit, and a flow resistance valve required downstream of the RO membrane for pressure build-up in the primary circuit is characterized in that at least one cleaning chamber with decalcifying ability and a discharge valve are located in the primary circuit and that the flow in the primary circuit is adjustable via a valve.

Claims

1. A device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by a reverse osmosis membrane (RO membrane) into a primary circuit and into a secondary circuit, a pump upstream of the RO membrane and downstream of a buffer vessel having multiple inlets and an outlet wherein fluid exiting the buffer vessel can enter the pump before entering the RO membrane, a flow resistance valve in the primary circuit downstream of the RO membrane for pressure build-up in the RO membrane wherein fluid exiting the RO membrane can enter the flow resistance valve before entering the buffer vessel, at least one cleaning chamber with decalcification means downstream of the flow resistance valve and a centrifugal chamber downstream of the least one cleaning chamber and upstream of the buffer vessel wherein fluid exiting the flow resistance valve can enter the cleaning chamber and the centrifugal chamber before entering the buffer vessel, the centrifugal chamber having a bottom connected to a discharge valve, wherein the flow resistance valve can be opened by a motor to flush the surfaces of the liquid-conducting components.

2. The device according to claim 1, wherein the cleaning chamber comprises capacitive and/or electromagnetic means.

3. The device according to claim 1, wherein a partial stream of the primary circuit circulates via a circulation pump only through the membrane and a second said cleaning chamber.

4. The device according to claim 1, wherein the cleaning chamber has three electrode connections.

5. The device according to claim 1, wherein the cleaning chamber is provided with a coil for producing a magnetic field.

6. The device according to claim 1, wherein the at least one cleaning chamber comprises two or more cleaning chambers connected in series or in parallel.

7. The device according to claim 1, wherein the primary circuit includes an optical or opto-electrical calcification sensor.

8. A device for producing ultrapure water according to the reverse osmosis principle, comprising a reverse osmosis filter which is subdivided by a reverse osmosis membrane (RO membrane) into a primary circuit and into a secondary circuit, a pump upstream of the RO membrane and downstream of a buffer vessel having multiple inlets and an outlet wherein fluid exiting the buffer vessel can enter the pump before entering the RO membrane, a flow resistance valve in the primary circuit downstream of the RO membrane for pressure build-up in the RO membrane wherein fluid exiting the RO membrane can enter the flow resistance valve before entering the buffer vessel, at least one cleaning chamber with decalcification means downstream of the flow resistance valve and a centrifugal chamber downstream of the least one cleaning chamber and upstream of the buffer vessel wherein fluid exiting the flow resistance valve can enter the cleaning chamber and the centrifugal chamber before entering the buffer vessel, the centrifugal chamber having a bottom connected to a discharge valve, wherein the flow resistance valve has a fixed flow resistance and comprises a bypass valve that can be opened to flush the surfaces of the liquid-conducting components.

9. The device according to claim 8, wherein the primary circuit can be flooded and flushed by opening one or both of the discharge and bypass valves.