Nanopore sensor device
First Claim
1. A sensor structure comprising:
- a first dielectric material layer and a second dielectric material layer in contact with each other at a planar interface, wherein a cavity is embedded within said second dielectric material layer and located above said first dielectric material layer;
an electrode line embedded within said second dielectric material layer and straddling said cavity, wherein first portions of said electrode line are in contact with a surface of said first dielectric material layer, and a second portion of said electrode line that is not in contact with said first dielectric material layer is spaced from a plane including said interface by a uniform distance; and
a dielectric spacer laterally surrounding said electrode line, wherein first portions of said dielectric spacer are in contact with said first dielectric material layer, and a second portion of said dielectric spacer that is not in contact with said first dielectric material layer is spaced from said plane including said interface by said uniform distance.
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Accused Products
Abstract
A pair of electrode plates can be provided by directional deposition and patterning of a conductive material on sidewalls of a template structure on a first dielectric layer. An electrode line straddling the center portion is formed. A dielectric spacer and a conformal conductive layer are subsequently formed. Peripheral electrodes laterally spaced from the electrode line are formed by pattering the conformal conductive layer. After deposition of a second dielectric material layer that encapsulates the template structure, the template structure is removed to provide a cavity that passes through the pair of electrode plates, the electrode line, and the peripheral electrodes. A nanoscale sensor thus formed can electrically characterize a nanoscale string by passing the nanoscale string through the cavity while electrical measurements are performed employing the various electrodes.
25 Citations
20 Claims
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1. A sensor structure comprising:
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a first dielectric material layer and a second dielectric material layer in contact with each other at a planar interface, wherein a cavity is embedded within said second dielectric material layer and located above said first dielectric material layer; an electrode line embedded within said second dielectric material layer and straddling said cavity, wherein first portions of said electrode line are in contact with a surface of said first dielectric material layer, and a second portion of said electrode line that is not in contact with said first dielectric material layer is spaced from a plane including said interface by a uniform distance; and a dielectric spacer laterally surrounding said electrode line, wherein first portions of said dielectric spacer are in contact with said first dielectric material layer, and a second portion of said dielectric spacer that is not in contact with said first dielectric material layer is spaced from said plane including said interface by said uniform distance. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A sensor structure comprising:
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a first dielectric material layer and a second dielectric material layer in contact with each other at a planar interface, wherein a cavity is embedded within said second dielectric material layer and located above said first dielectric material layer; and an electrode line embedded within said second dielectric material layer and straddling said cavity, wherein first portions of said electrode line are in contact with a surface of said first dielectric material layer, and a second portion of said electrode line that is not in contact with said first dielectric material layer is spaced from a plane including said interface by a uniform distance, wherein a vertical distance a top surface and a bottom surface of a first portion of said electrode line in contact with said first dielectric material layer is the same as a vertical distance between a top surface and a bottom surface of a second portion of said electrode line overlying said cavity. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A sensor structure comprising:
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a first dielectric material layer and a second dielectric material layer in contact with each other at a planar interface, wherein a cavity is embedded within said second dielectric material layer and located above said first dielectric material layer; and an electrode line embedded within said second dielectric material layer and straddling said cavity, wherein first portions of said electrode line are in contact with a surface of said first dielectric material layer, and a second portion of said electrode line that is not in contact with said first dielectric material layer is spaced from a plane including said interface by a uniform distance, wherein said cavity comprises; a uniform width cavity portion having a uniform width throughout; a first tapered cavity portion adjoined to said uniform width cavity portion at a proximal end thereof and having a first variable width that increases with distance from said uniform width cavity portion; and a second tapered cavity portion adjoined to said uniform width cavity portion at a proximal end thereof and having a second variable width that increases with distance from said uniform width cavity portion. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification