Group III-nitride laser diode grown on a semi-polar orientation of gallium and nitrogen containing substrates
First Claim
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1. An optical device comprising:
- a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by a {30-3-1} surface orientation or an offcut of the {30-3-1} plane;
a laser stripe region formed overlying a portion of the semipolar crystalline surface region, the laser stripe region being characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end;
a first facet provided on the first end of the laser stripe region;
a second facet provided on the second end of the laser stripe region;
an n-type cladding region overlying the semipolar crystalline surface region;
an active region comprising at least one active layer overlying the n-type cladding region;
the at least one active layer comprising a quantum well region or a double hetero-structure region; and
a p-type cladding region overlying the active region;
wherein the active layer region is configured to emit electromagnetic radiation characterized by a wavelength ranging from about 430 nm to about 475 nm;
wherein the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction; and
wherein the surface orientation is inclined from (30-3-1) within −
10 degrees to +10 degrees about the in-plane projection of the [0001] direction.
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Abstract
Blue laser diode (LD) structures are grown on a particular subset of semi-polar GaN substrate orientations that offer a distinct set of advantages relative to both (0001), non-polar oriented devices, and alternative semipolar-polar oriented devices operating in the blue regime are disclosed. In particular, the (30-3-1) and (30-31) gallium and nitrogen containing surface orientation and equivalent planes show narrower luminescence spectra than equivalent devices grown on the nonpolar {10-10} m-plane or semipolar planes tilted away from m-plane toward the c-plane between angles of about 0 degrees to about 7 or 8 degrees such as {60-6-1).
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Citations
25 Claims
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1. An optical device comprising:
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a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by a {30-3-1} surface orientation or an offcut of the {30-3-1} plane; a laser stripe region formed overlying a portion of the semipolar crystalline surface region, the laser stripe region being characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar crystalline surface region; an active region comprising at least one active layer overlying the n-type cladding region;
the at least one active layer comprising a quantum well region or a double hetero-structure region; anda p-type cladding region overlying the active region; wherein the active layer region is configured to emit electromagnetic radiation characterized by a wavelength ranging from about 430 nm to about 475 nm; wherein the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction; and
wherein the surface orientation is inclined from (30-3-1) within −
10 degrees to +10 degrees about the in-plane projection of the [0001] direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An optical device comprising:
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a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by {30-3-1} surface orientation or an offcut of the {30-3-1} plane; a laser stripe region formed overlying a portion of the semipolar crystalline surface region, the laser stripe region being characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar crystalline surface region, the n-type cladding region being substantially free of Al-bearing species; an active region comprising at least one active layer region overlying the n-type cladding region, wherein a total thickness of the at least one active layer region is greater than or equal to 10 nm, and the active region comprises a quantum well region or a double hetero-structure region; a p-type cladding region overlying the active layer region, the p-type cladding region being substantially free of Al-bearing species; wherein the at least one active layer region is configured to emit electromagnetic radiation characterized by a wavelength ranging from about 430 nm to about 475 nm; wherein the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction. - View Dependent Claims (15, 16, 17)
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18. An optical device comprising:
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a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by a {30-3-1} surface orientation or offcut of the {30-3-1} plane; a laser stripe region formed overlying a portion of the semipolar crystalline surface region, the laser stripe region being characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar crystalline surface region, the n-type cladding region being substantially free of Al-bearing species; an active region comprising at least one active layer region overlying the n-type cladding region, wherein a total thickness of the at least one active layer region is greater than or equal to 20 nm; and a p-type cladding region overlying the at least one active layer region, the p-type cladding region being substantially free of Al-bearing species; wherein the at least one active layer region is configured to emit electromagnetic radiation characterized by a wavelength ranging from about 430 nm to about 470 nm; wherein the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction. - View Dependent Claims (25)
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19. A method for manufacturing an optical device, the method comprising:
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providing a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by a {30-3-1} surface orientation or an offcut of the {30-3-1} plane; forming a laser stripe region overlying a portion of the semipolar crystalline surface region, the laser stripe region characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end, the first end having a first etched facet and the second end having a second etched facet; forming an n-type cladding region over the semipolar crystalline surface region, the n-type cladding region being substantially free of Al-bearing species; forming an active region comprising at least one active layer region overlying the n-type cladding region at a first temperature range, the at least one active layer region being configured to emit electromagnetic radiation characterized by a wavelength ranging from about 425 nm to about 475 nm and a total thickness of the at least one active layer region being greater than or equal to 10 nm, the active region comprising a quantum well region or double heterostructure region; and forming a p-type cladding region overlying the active region using a second temperature range of at least 100 degrees greater than an upper limit of the first temperature range provided during formation of the active region, the p-type cladding region being substantially free of Al-bearing species; wherein the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding, to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction. - View Dependent Claims (20, 21, 22)
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23. An optical device comprising:
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a gallium and nitrogen containing member having a semipolar crystalline surface region characterized by a {30-3-1} surface orientation or an offcut of the {30-3-1} plane; a laser stripe region formed overlying a portion of the semipolar crystalline surface region, the laser stripe region being characterized by a cavity orientation substantially parallel to the projection of the c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar crystalline surface region, the n-type cladding region being substantially free of Al-bearing species; an active region comprising at least one active layer region overlying the n-type cladding region, a total thickness of the at least one active layer region greater than or equal to 15 nm; a p-type cladding region overlying the active region, the p-type cladding region being substantially free of Al-bearing species;
whereinthe p-cladding region is deposited at a growth temperature of greater than 100 degrees Celsius higher than a growth temperature of the active layers in the active region; the at least one active layer region is configured to emit electromagnetic radiation characterized by a wavelength ranging from about 430 nm to about 470 nm; and the surface orientation is inclined from (30-3-1) within −
3 degrees to +2 degrees about the in-plane [11-20] direction toward an m-plane, wherein the m-plane is a (10-10) plane, the −
3 degrees to +2 degrees corresponding to an inclination of approximately 8 degrees and 13 degrees, respectively, from the m-plane about the in-plane [11-20] direction. - View Dependent Claims (24)
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Specification