Organic light emitting diode display and method for manufacturing the same

• US 9,024,305 B2
• Filed: 09/11/2013
• Issued: 05/05/2015
• Est. Priority Date: 05/21/2013
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Choi, Jae-Beom, Park, Hyoung-Min, Park, Yong-Woo, Noh, Hwa-Jin
• Primary Examiner(s): Le, Thao X
• Assistant Examiner(s): REDDINGTON, PATRICIA D
• Application Number:
  US14/023,666
• Publication Number:
  US 20140346449A1
• Time in Patent Office: 601 Days
• Field of Search: 257/40
• US Class Current: 257/40
• CPC Class Codes: H10K 50/813 characterised by their shape
• CPC Class Codes: H10K 50/854 comprising scattering means
• CPC Class Codes: H10K 50/858 comprising refractive means, e.g. lenses
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/124 Insulating layers formed between TFT elements and OLED elements
• CPC Class Codes: H10K 59/35 comprising red-green-blue [RGB] subpixels
• CPC Class Codes: H10K 59/80515 characterised by their shape
• CPC Class Codes: H10K 59/877 comprising scattering means
• CPC Class Codes: H10K 59/879 comprising refractive means, e.g. lenses
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass

Abstract

An organic light emitting diode display includes a substrate, a planarization layer disposed on the substrate, a first electrode disposed on the planarization layer, an emission layer disposed on the first electrode, and a second electrode disposed on the emission layer, wherein an uneven pattern is formed on a top surface of the planarization layer, the uneven pattern comprises a strip line having a plurality of thicknesses and widths, and a thickness of the strip line becomes smaller as a distance from a center portion of the first electrode becomes larger.

Claims

1. An organic light emitting diode display, comprising:

a substrate;

a planarization layer on the substrate and comprising a unitary uneven pattern on a top surface thereof;

a first electrode on the planarization layer;

an emission layer on the first electrode; and

a second electrode on the emission layer,

wherein

the unitary uneven pattern is defined by a plurality of strip lines respectively having different thicknesses and widths, and

each respective strip has a thickness that becomes smaller as a distance between the respective strip line and a center portion of the first electrode becomes larger.

2. The organic light emitting diode display of claim 1, further comprising a thin film transistor layer between the substrate and the planarization layer.

3. The organic light emitting diode display of claim 1, wherein a width of strip lines of the plurality of strip lines becomes larger as the distance from the center portion of the first electrode becomes larger.

4. The organic light emitting diode display of claim 1, wherein the planarization layer has a thickness of about 0.1 μ

m to about 10 μ

m.

5. The organic light emitting diode display of claim 1, wherein the emission layer comprises a plurality of sub-emission layers which emits lights of different wavelengths from each other, and the lights of different wavelengths combine for white-light emission.

6. The organic light emitting diode display of claim 5, further comprising a color filter under the first electrode.

7. A manufacturing method of an organic light emitting diode display, comprising:

disposing a planarization layer on a substrate;

forming a unitary uneven pattern including a plurality of spaces defining a plurality of protruded strip lines on a top surface of the planarization layer;

disposing a first electrode on the planarization layer;

disposing an emission layer on the first electrode; and

disposing a second electrode on the emission layer,

wherein the forming of the unitary uneven pattern comprises etching the planarization layer, and a difference in a degree of etching exists between a center portion and an end portion of the first electrode where the difference in the degree of etching defines thicknesses of the protruded strip lines being smaller as a distance between the protruded strip lines and the center portion of the first electrode becomes larger.

8. The manufacturing method of the organic light emitting diode display of claim 7, further compring disposing a plurality of thin film transistors between the substrate and the planarization layer.

9. The manufacturing method of the organic light emitting diode display of claim 7, wherein the forming of the uneven pattern on the top surface of the planarization layer comprises arranging a mask including an opening defined therein on the planarization layer to expose the planarization layer to light, developing the planarization layer, etching the light exposed planarization layer and curing the developed planarization layer.

10. The manufacturing method of the organic light emitting diode display of claim 9, wherein the difference in the degree of etching is defined by a difference in light transmission of the mask between the center portion and the end portion.