Semiconductor device
First Claim
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1. A semiconductor device comprising:
- a first transistor comprising;
a stacked layer including a first oxide semiconductor layer and a second oxide semiconductor layer, the stacked layer overlapped with a first gate electrode layer with a first insulating layer interposed therebetween; and
a second transistor comprising;
a third oxide semiconductor layer overlapped with a second gate electrode layer with a second insulating layer interposed therebetween,wherein an oxide insulating layer covers and be in contact with a peripheral portion and a side surface of the stacked layer, andwherein a source electrode layer and a drain electrode layer which are electrically connected to the second oxide semiconductor layer are provided over the oxide insulating layer.
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Abstract
One object is to provide a semiconductor device with a structure which enables reduction in parasitic capacitance sufficiently between wirings. In a bottom-gate type thin film transistor including a stacked layer of a first layer which is a metal thin film oxidized partly or entirely and an oxide semiconductor layer, the following oxide insulating layers are formed together: an oxide insulating layer serving as a channel protective layer which is over and in contact with a part of the oxide semiconductor layer overlapping with a gate electrode layer; and an oxide insulating layer which covers a peripheral portion and a side surface of the stacked oxide semiconductor layer.
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Citations
21 Claims
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1. A semiconductor device comprising:
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a first transistor comprising; a stacked layer including a first oxide semiconductor layer and a second oxide semiconductor layer, the stacked layer overlapped with a first gate electrode layer with a first insulating layer interposed therebetween; and a second transistor comprising; a third oxide semiconductor layer overlapped with a second gate electrode layer with a second insulating layer interposed therebetween, wherein an oxide insulating layer covers and be in contact with a peripheral portion and a side surface of the stacked layer, and wherein a source electrode layer and a drain electrode layer which are electrically connected to the second oxide semiconductor layer are provided over the oxide insulating layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A semiconductor device comprising:
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a gate electrode layer; a gate insulating layer over the gate electrode layer; an oxide semiconductor layer overlapped with the gate electrode layer with the gate insulating layer interposed therebetween; an oxide insulating layer, wherein the oxide insulating layer covers and be in contact with a peripheral portion and a side surface of the oxide semiconductor layer; and a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer, wherein the source electrode layer and the drain electrode layer are provided over the oxide insulating layer, wherein the oxide semiconductor layer comprises a first region which comprises a channel formation region, and a second region other than the first region, and wherein a first carrier concentration of the first region is lower than a second carrier concentration of the second region. - View Dependent Claims (12, 13, 14, 15)
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16. A semiconductor device comprising:
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a gate electrode layer; a gate insulating layer over the gate electrode layer; an oxide semiconductor layer overlapped with the gate electrode layer with the gate insulating layer interposed therebetween; an oxide insulating layer, wherein the oxide insulating layer covers and be in contact with a peripheral portion and a side surface of the oxide semiconductor layer; and a source electrode layer and a drain electrode layer electrically connected to the oxide semiconductor layer, wherein the source electrode layer and the drain electrode layer are provided over the oxide insulating layer, wherein the oxide semiconductor layer comprises a first region which comprises a channel formation region, and a second region other than the first region, and wherein a first oxygen concentration of the first region is higher than a second oxygen concentration of the second region. - View Dependent Claims (17, 18, 19, 20, 21)
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Specification