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Lithographic apparatus and device manufacturing method

  • US 9,025,127 B2
  • Filed: 09/23/2011
  • Issued: 05/05/2015
  • Est. Priority Date: 08/29/2003
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a substrate table constructed to hold a substrate;

    a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

    a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising an ultra-violet radiation source configured to irradiate the liquid prior to entry into the space; and

    a dispenser configured to add a chemical to the liquid in the liquid supply system.

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