Lithographic apparatus and device manufacturing method

• US 9,025,127 B2
• Filed: 09/23/2011
• Issued: 05/05/2015
• Est. Priority Date: 08/29/2003
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Dierichs, Marcel Mathijs Theodore Marie, Donders, Sjoerd Nicolaas Lambertus, Jacobs, Johannes Henricus Wilhelmus, Jansen, Hans, Loopstra, Erik Roelof, Mertens, Jeroen Johannes Sophia Maria, Stavenga, Marco Koert, Streefkerk, Bob, Verhagen, Martinus Cornelis Maria, Seuntiens-Gruda, Lejla
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US13/242,221
• Publication Number:
  US 20120013874A1
• Time in Patent Office: 1,320 Days
• Field of Search: 355/53, 355/30, 355/55, 355/77, 355/72, 359/380, 359/886, 210/188, 210/321.6, 210/650, 210/640
• US Class Current: 355/30
• CPC Class Codes: B01D 19/0031 by filtration
• CPC Class Codes: B01D 61/025 Reverse osmosis; Hyperfiltration
• CPC Class Codes: C02F 1/04 by distillation or evaporation
• CPC Class Codes: C02F 1/20 by degassing, i.e. liberation of dissolved gases degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D
• CPC Class Codes: C02F 1/28 by sorption using ion-exchange C02F1/42; sorbent compositions B01J
• CPC Class Codes: C02F 1/283 using coal, charred products, or inorganic mixtures containing them
• CPC Class Codes: C02F 1/32 with ultraviolet light
• CPC Class Codes: C02F 1/42 by ion-exchange ion-exchange in general B01J
• CPC Class Codes: C02F 1/441 by reverse osmosis
• CPC Class Codes: C02F 2103/40 from the manufacture or use of photosensitive materials
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

Claims

1. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising an ultra-violet radiation source configured to irradiate the liquid prior to entry into the space; and

a dispenser configured to add a chemical to the liquid in the liquid supply system.

2. The apparatus according to claim 1, further comprising a filter configured to separate particles from the liquid.

3. The apparatus according to claim 1, further comprising a degasser configured to separate gas and liquid prior to entry of the liquid into the space.

4. The apparatus according to claim 3, wherein the degasser comprises a membrane configured to contact the liquid to separate gas and liquid.

5. The apparatus according to claim 1, further comprising a measurement device configured to measure a property of the liquid indicative of contamination.

6. The apparatus according to claim 5, wherein the property is an electrical property of the liquid.

7. The apparatus according to claim 5, wherein the liquid supply system comprises a liquid confinement structure configured to at least partly confine the liquid within the space and the measurement device is configured to measure the property of the liquid in a flow path between the liquid confinement structure and a gas content reduction device configured to reduce the gas content of the liquid.

8. The apparatus according to claim 1, wherein the ultra-violet radiation is selected to kill lifeforms in the liquid and further comprising a particle filter configured to capture lifeforms killed by the ultra-violet radiation.

9. The apparatus according to claim 1, further comprising an ion exchange material configured to contact the irradiated liquid.

10. The apparatus according to claim 1, wherein the dispenser is configured to add ozone, a halogen containing compound, an alcohol, an aldehyde, or a heavy metal, to the liquid supply system.

11. The apparatus according to claim 1, wherein the dispenser is configured to add a surfactant, a wetting agent, or both, to the liquid supply system.

12. A lithographic projection apparatus comprising:

a movable table;

a projection system configured to project a patterned radiation beam onto a target portion of a substrate;

a liquid supply system configured to at least partly fill a space between the projection system and the table with a liquid;

a member having;

an opening, in a bottom surface of the member, configured to remove at least part of the immersion liquid from the space, and

an open aperture located underneath a lower surface of the projection system and above the table, a cross-sectional dimension of the aperture being smaller than a cross-sectional dimensional of the lower surface of the projection system, the open aperture configured to allow the liquid to flow therethrouqh between above the open aperture and below the open aperture, and the open aperture configured to allow the radiation beam to pass therethrouqh;

an inlet configured to supply the immersion liquid to the space at a position located above the aperture;

an ultra-violet radiation source configured to irradiate the liquid prior to entry of the liquid into the space;

a filter configured to separate particles from the liquid; and

a degasser configured to separate gas and liquid.

13. The apparatus according to claim 12, further comprising a measurement device configured to measure a property of the liquid indicative of contamination.

14. The apparatus according to claim 13, wherein the property is an electrical property of the liquid.

15. The apparatus according to claim 12, further comprising an ion exchange material configured to contact the irradiated liquid.

16. The apparatus according to claim 12, further comprising an adding device configured to add a surfactant, a wetting agent, or both, to the liquid supply system.

17. A device manufacturing method comprising:

at least partly filling a space between a projection system of an exposure apparatus and a substrate with a liquid;

irradiating the liquid prior to entry into the space with ultra-violet radiation;

adding a chemical to the liquid; and

projecting a patterned radiation beam through the liquid in the space onto a target portion of the substrate.

18. The method of claim 17, further comprising measuring an electrical property of the liquid.

19. The method of claim 18, further comprising degassing the liquid prior to entry into the space.

20. The method of claim 19, further comprising filtering particles in the liquid.

21. The method of claim 20, further comprising degassing the liquid downstream from an outlet from the space.

22. A lithographic projection apparatus comprising:

a substrate table constructed to hold a substrate;

a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and

a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system comprising;

an ultra-violet radiation source configured to irradiate the liquid prior to entry into the space,

a conduit to route the liquid to an inlet to the space, and

a further conduit that branches off the conduit before the inlet and branches into the conduit upstream of where the further conduit branches off the conduit, the further conduit configured to route at least part of the liquid back upstream to a portion of the liquid supply system through which the at least part of the liquid has passed.