Device for preventing intensity reduction of optical signal, optical emission spectrometer, optical instrument, and mass spectrometer including the same

• US 9,025,143 B2
• Filed: 11/10/2011
• Issued: 05/05/2015
• Est. Priority Date: 11/12/2010
• Status: Active Grant

• Current Assignee: Industry Academic Cooperation Foundation
• Original Assignee: Industry Academic Cooperation Foundation
• Inventors: Hahn, Jae Won
• Primary Examiner(s): Geisel, Kara E
• Assistant Examiner(s): SMITH, MAURICE C
• Application Number:
  US13/293,265
• Publication Number:
  US 20120120395A1
• Time in Patent Office: 1,272 Days
• US Class Current: 356/316
• CPC Class Codes: G01J 3/0229 using masks, aperture plates, spatial light modulators or spatial filters, e.g. reflective filters
• CPC Class Codes: G01J 3/0286 Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
• CPC Class Codes: G01J 3/443 Emission spectrometry
• CPC Class Codes: H01J 49/0422 for gaseous samples interfaces to gas chromatographs G01N30/7206
• CPC Class Codes: H01J 49/068 Mounting, supporting, spacing, or insulating electrodes
• CPC Class Codes: H05K 9/009 comprising electro-conductive fibres, e.g. metal fibres, carbon fibres, metallised textile fibres, electro-conductive mesh, woven, non-woven mat, fleece, cross-linked

Abstract

A device for a device for preventing the intensity reduction of an optical signal, an optical emission spectrometer, an optical instrument, and a mass spectrometer including the same are provided. The device for preventing the intensity reduction includes a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field for a wafer processing, is installed in the front of an optical window of an optical emission spectrometer for measuring the plasma field from an emission spectrum image of the plasma field, and collects charging particles passing through the mesh.

Claims

1. A device for preventing the intensity reduction of an optical signal, comprising:

an optical emission spectrometer for measuring a plasma field from an emission spectrum image of the plasma field, wherein the plasma field is used for wafer processing, wherein the optical emission spectrometer comprises;

a window for collecting an emission spectrum of the plasma field, and

a shielding filter positioned in front of the optical window, wherein the shielding filter has a mesh structure capable of blocking RF electromagnetic waves radiated from the plasma field and collects charged particles passing through the mesh.

2. The device for preventing the intensity reduction of an optical signal of claim 1, wherein one shielding filter has an extension surface in a vertical direction to input and inflow paths of a plasma emission spectrum.

3. The device for preventing the intensity reduction of an optical signal of claim 1, wherein a plurality of shielding filters having an extension surface in a vertical direction to input and inflow paths of the plasma emission spectrum are continuously arranged according to the input and inflow paths of the plasma emission spectrum.

4. The device for preventing the intensity reduction of an optical signal of claim 3, wherein the plurality of shielding filters include hollow parts and crossing parts of the mesh having the same phase as each other.

5. The device for preventing the intensity reduction of an optical signal of claim 3, wherein the plurality of shielding filters include hollow parts and crossing parts of the mesh having different phases from each other.

6. The device for preventing the intensity reduction of an optical signal of claim 5, wherein each of the plurality of shielding filters has directions of linear elements configuring the mesh which are disposed to be different from each other.

7. The device for preventing the intensity reduction of an optical signal of claim 5, wherein the plurality of shielding filters have a regular phase difference according to the direction of the linear element configuring the mesh.

8. The device for preventing the intensity reduction of an optical signal of claim 5, wherein the plurality of shielding filters have mesh structures having different densities.

9. The device for preventing the intensity reduction of an optical signal of claim 1, further comprising:

a fixation frame which has a shape corresponding to a circumference of the shielding filter, is connected to the shielding filter, and assembled to the front end of the optical window of the optical emission spectrometer.

10. The device for preventing the intensity reduction of an optical signal of claim 9, wherein insertion grooves into which the shielding filter is inserted and fixed are formed at the inner portion of the fixation frame.

11. The device for preventing the intensity reduction of an optical signal of claim 9, wherein the fixation frame is contact-connected to one-side circumference of the shielding filter to restrict the shielding filter or pressurized toward the front end of the optical emission spectrometer.

12. The device for preventing the intensity reduction of an optical signal of claim 11, further comprising:

an insertion ring inserted between the front end of the optical emission spectrometer and the shielding filter and/or between the shielding filters with a spaced interval.

13. The device for preventing the intensity reduction of an optical signal of claim 12, the insertion ring is made of an elastic member.

14. An optical emission spectrometer for measuring plasma, comprising:

a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from a plasma field is used for wafer processing, is installed in the front of an optical window into which an emission spectrum of the plasma field is inputted, and collects charged particles passing through the mesh;

an optical system main body including a receiving lens receiving the plasma emission spectrum passing through the shielding filter, an aperture determining a size of the optical signal inputted to and/or outputted from the receiving lens, and a pinhole limiting the depth of focus of the optical signal passing through the receiving lens; and

an analyzer analyzing emission spectrum image of the plasma field by receiving the optical signal passing through the aperture and the pinhole from the optical system main body.

15. The optical emission spectrometer of claim 14, further comprising:

a protection window made of a transparent material and disposed between the receiving lens and the shielding filter.

16. The optical emission spectrometer of claim 14, further comprising:

a laser device irradiate a laser in a proceeding direction and an opposed direction of the optical signal in the optical system main body so that the receiving lens, the aperture, and the pinhole are aligned and controlled therebetween by matching a collecting position of the laser light and a measuring position of the plasma field.

17. An optical instrument comprising:

an optical emission spectrometer for measuring a plasma field from an emission spectrum image of the plasma field,

wherein the optical emission spectrometer comprises;

a window for collecting the emissions spectrum and preventing the intensity reduction of the plasma field;

a shielding filter which has a mesh structure capable of blocking RF electromagnetic waves radiated from the plasma field is used for wafer processing, positioned in the front of the optical window into which the emission spectrum of the plasma field is inputted, and collects charged particles passing through the mesh;

a lens receiving a plasma emission spectrum passing through the shielding filter.