Resonator structures and method of making

• US 9,027,236 B2
• Filed: 05/31/2011
• Issued: 05/12/2015
• Est. Priority Date: 05/31/2011
• Status: Active Grant

• Current Assignee: General Electric Company
• Original Assignee: General Electric Company
• Inventors: Krishna, Kalaga Murali, Reddy, Sudhakar Eddula, Matani, Lohit
• Primary Examiner(s): Lee, Benny
• Assistant Examiner(s): PATEL, RAKESH BHASKARBHAI
• Application Number:
  US13/118,663
• Publication Number:
  US 20120306280A1
• Time in Patent Office: 1,442 Days
• Field of Search: 333/219, 296/021, 298/25, 307/104
• US Class Current: 29/825
• CPC Class Codes: H01P 11/008 Manufacturing resonators
• CPC Class Codes: H01P 7/00 Resonators of the waveguide type
• CPC Class Codes: H02J 50/12 of the resonant type
• CPC Class Codes: Y10T 29/4902 Electromagnet, transformer or inductor
• CPC Class Codes: Y10T 29/49117 Conductor or circuit manufacturing

Abstract

A resonator in the Swiss-roll structure, method of making the resonator structure and the system employing the resonator are disclosed. The resonator includes a plurality of layers, including a ceramic layer and a metallic layer. The ceramic and metallic layers are configured in a Swiss-roll form such that the neighboring ceramic layers are separated by the metallic layer. Further, the ceramic layer includes materials that have a dielectric constant of at least about 10 and dielectric loss tangent less than about 0.01 in the frequency range of about 1 KHz to about 100 MHz. The method of forming the resonator includes the steps of disposing a metallic layer, depositing a dielectric ceramic layer, and forming a Swiss-roll structure of the metallic and ceramic layers. Alternate method includes swaging the dielectric material filled metal tubes and forming into Swiss-rolls. Further steps include heat treating the resultant Swiss-roll structure in vacuum, inert atmosphere, or reducing atmosphere to form a monolithic Swiss-roll structure, such that the air gap between turns of the Swiss-roll structure is less than about 1 μm.

Claims

1. A method of forming a resonator, comprising:

disposing a metallic layer;

providing a buffer layer over the metallic layer;

depositing a dielectric ceramic layer over the buffer layer;

forming a Swiss-roll structure of the metallic layer and the ceramic layer; and

heat treating the Swiss-roll structure in a vacuum, inert atmosphere, or reducing atmosphere to form a monolithic Swiss-roll structure, wherein an air gap between turns of the Swiss-roll structure is less than about 1 μ

m.

2. The method of claim 1, wherein the metallic layer is prepared by disposing metallic powders.

3. The method of claim 1, wherein the heat treating of the metallic layer, buffer layer, and ceramic layer of the Swiss-roll structure obtains an integrated monolithic structure of density greater than 98% by volume.

4. The method of claim 3, wherein the temperature of the heat treatment is less than the melting point of the metallic layer.

5. A method of forming a resonator, comprising:

filling-in a metallic hollow tube with a dielectric ceramic material to form a filled metallic tube;

swaging or rolling of the filled metallic tube to form a layered structure comprising a ceramic layer in between two metallic layers;

winding the layered structure to form a Swiss-roll structure from the two metallic layers and the ceramic layer; and

heat treating the Swiss-roll structure in a vacuum, inert atmosphere, or reducing atmosphere to form a monolithic Swiss-roll structure, wherein an air gap between turns of Swiss-roll structure is less than about 1 μ

m.

6. The method of claim 5, further comprising machining or chemically etching outer edges of the Swiss-roll structure to expose the ceramic and the two metallic layers.