Method and apparatus for fractional skin treatment
First Claim
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1. An RF skin treatment apparatus, comprising:
- an RF voltage source configured to apply an RF pulse to skin; and
at least one processor configured to;
monitor skin impedance as the RF pulse is applied to the skin; and
vary the RF pulse in response to the monitored skin impedance in order to cause ablation of the skin,cut the RF pulse when the monitored skin impedance is beyond a pre-set threshold; and
when the monitored skin impedance is beyond the pre-set threshold, direct energy to an energy absorbing element.
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Abstract
An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.
35 Citations
28 Claims
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1. An RF skin treatment apparatus, comprising:
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an RF voltage source configured to apply an RF pulse to skin; and at least one processor configured to; monitor skin impedance as the RF pulse is applied to the skin; and vary the RF pulse in response to the monitored skin impedance in order to cause ablation of the skin, cut the RF pulse when the monitored skin impedance is beyond a pre-set threshold; and when the monitored skin impedance is beyond the pre-set threshold, direct energy to an energy absorbing element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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Specification