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Methods for forming a channel through a polymer layer using one or more photoresist layers

  • US 9,028,772 B2
  • Filed: 06/28/2013
  • Issued: 05/12/2015
  • Est. Priority Date: 06/28/2013
  • Status: Expired due to Fees
First Claim
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1. A method comprising:

  • forming one or more photoresist layers over a sensor located on a structure, such that the sensor is covered by the one or more photoresist layers, wherein the sensor is configured to detect an analyte;

    forming a first polymer layer, wherein the first polymer layer defines a posterior side of an eye-mountable device;

    positioning the structure on the first polymer layer;

    forming a second polymer layer over the first polymer layer and the structure, such that the structure is fully enclosed by the first polymer layer, the second polymer layer, and the one or more photoresist layers, wherein the second polymer layer defines an anterior side of the eye-mountable device; and

    removing the one or more photoresist layers to form a channel through the second polymer layer, wherein the sensor is configured to receive the analyte via the channel.

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