MEMS pressure sensors and fabrication method thereof
First Claim
1. A method for fabricating a MEMS capacitive pressure sensor, comprising:
- providing a substrate having a first region and a second region;
forming a first dielectric layer one the substrate;
forming a first electrode layer on the first dielectric layer;
forming a second dielectric layer on the first electrode layer;
etching the second dielectric layer until the first electrode layer is exposed to form a plurality of first openings;
forming a plurality of conductive sidewalls connecting with the first electrode layer on sidewalls of the first openings;
forming a sacrificial layer on a surface of the second dielectric layer in the peripheral region, surfaces of the conductive sidewalls and surfaces of the bottoms of the first openings;
forming a second electrode layer with a plurality of third openings exposing a portion of the sacrificial layer on the sacrificial layer;
removing the sacrificial layer to form a chamber between the conductive sidewalls and the second electrode layer in the first region; and
forming a third dielectric layer with a second opening exposing the surface of a portion of the second electrode layer in the first region on the second electrode layer.
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Abstract
A MEMS capacitive pressure sensor is provided. The pressure sensor includes a substrate having a first region and a second region, and a first dielectric layer formed on the substrate. The pressure sensor also includes a first electrode layer formed on the first dielectric layer, and a second dielectric layer having first openings formed on the first electrode layer. Further, the pressure sensor includes conductive sidewalls connecting with the first electrode layer formed on sidewalls of the first openings, and a second electrode layer with a portion formed on the second dielectric layer in the second region and the rest suspended over the conductive sidewalls in the first region. Further, the pressure sensor also includes a chamber between the conductive sidewalls and the second electrode layer; and a third dielectric layer formed on the second electrode layer exposing a portion of the second electrode layer in the first region.
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Citations
8 Claims
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1. A method for fabricating a MEMS capacitive pressure sensor, comprising:
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providing a substrate having a first region and a second region; forming a first dielectric layer one the substrate; forming a first electrode layer on the first dielectric layer; forming a second dielectric layer on the first electrode layer; etching the second dielectric layer until the first electrode layer is exposed to form a plurality of first openings; forming a plurality of conductive sidewalls connecting with the first electrode layer on sidewalls of the first openings; forming a sacrificial layer on a surface of the second dielectric layer in the peripheral region, surfaces of the conductive sidewalls and surfaces of the bottoms of the first openings; forming a second electrode layer with a plurality of third openings exposing a portion of the sacrificial layer on the sacrificial layer; removing the sacrificial layer to form a chamber between the conductive sidewalls and the second electrode layer in the first region; and forming a third dielectric layer with a second opening exposing the surface of a portion of the second electrode layer in the first region on the second electrode layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification