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Methods of and apparatuses for measuring electrical parameters of a plasma process

  • US 9,029,728 B2
  • Filed: 04/14/2014
  • Issued: 05/12/2015
  • Est. Priority Date: 04/19/2001
  • Status: Expired due to Fees
First Claim
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1. A sensor apparatus for measuring a plasma process parameter for processing a workpiece, the sensor apparatus comprising:

  • a base;

    an information processor supported on or in the base;

    an electrostatic charge sensor supported on or in the base and coupled to the information processor, the sensor having an electrostatic charge sensing element and a transducer coupled to the sensing element, wherein the sensing element is configured so as to provide a signal that represents a plasma process parameter measurement and wherein the transducer is configured so as to receive the signal from the sensing element and convert the signal into a second signal for input to the information processor.

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