Cryopump and vacuum pumping method
First Claim
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1. A cryopump comprising:
- a first cryopanel comprising a radiation shield having an opening and a baffle arranged in the opening;
a second cryopanel surrounded by the first cryopanel; and
a refrigerator configured to cool the first cryopanel to a first cooling temperature and to cool the second cryopanel to a second cooling temperature lower than the first cooling temperature,whereinthe baffle includes an exterior surface having a first surface roughness and a second surface roughness being smaller than the first surface roughness andwherein a first center-line average roughness of the first surface roughness is within a range of 0.5 μ
m to 100 μ
m and a second center-line average roughness of the second surface roughness is within a range of 1 nm to 400 nm.
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Abstract
A cryopump 10 includes: a first cryopanel including a radiation shield 18 having a shield opening 20 and a louver 23 arranged in the shield opening 20; a second cryopanel 24 surrounded by the first cryopanel; and a refrigerator 14 configured to cool the first cryopanel to a first cooling temperature and to cool the second cryopanel to a second cooling temperature lower than the first cooling temperature. A rough surface 42 is formed on the louver 23.
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Citations
5 Claims
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1. A cryopump comprising:
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a first cryopanel comprising a radiation shield having an opening and a baffle arranged in the opening; a second cryopanel surrounded by the first cryopanel; and a refrigerator configured to cool the first cryopanel to a first cooling temperature and to cool the second cryopanel to a second cooling temperature lower than the first cooling temperature, wherein the baffle includes an exterior surface having a first surface roughness and a second surface roughness being smaller than the first surface roughness and wherein a first center-line average roughness of the first surface roughness is within a range of 0.5 μ
m to 100 μ
m and a second center-line average roughness of the second surface roughness is within a range of 1 nm to 400 nm. - View Dependent Claims (2, 3, 4, 5)
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Specification
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Current AssigneeSumitomo Heavy Industries Limited
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Original AssigneeSumitomo Heavy Industries Limited
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InventorsTanaka, Hidekazu
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Primary Examiner(s)Jules, Frantz
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Assistant Examiner(s)KING, BRIAN M
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Application NumberUS13/508,936Publication NumberTime in Patent Office1,918 DaysField of Search62/555US Class Current62/55.5CPC Class CodesF04B 37/08 by condensing or freezing, ...
