Gas bearing electrostatic chuck

• US 9,036,326 B2
• Filed: 04/30/2008
• Issued: 05/19/2015
• Est. Priority Date: 04/30/2008
• Status: Active Grant

• Current Assignee: Axcelis Technologies Incorporated
• Original Assignee: Axcelis Technologies Incorporated
• Inventors: Lee, William David, LaFontaine, Marvin Raymond, Purohit, Ashwin Madhukar, Gillespie, Joseph Daniel, Beckel, Donovan, Tao, Teng Chao, Slocum, Alexander Henry, Nayfeh, Samir
• Primary Examiner(s): Tran, Thienvu
• Assistant Examiner(s): HOANG, ANN THI
• Application Number:
  US12/113,091
• Publication Number:
  US 20090273878A1
• Time in Patent Office: 2,575 Days
• Field of Search: 361/234
• US Class Current: 361/234
• CPC Class Codes: H01L 21/6831 using electrostatic chucks

Abstract

An electrostatic clamp is provided having a clamping plate, wherein the clamping plate has a central region and an annulus region. A plurality of gas supply orifices are defined in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices. One or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas. A seal is disposed in the annulus region of the clamping plate, wherein the seal is configured to generally prevent a leakage of the cushion of gas from the central region to an environment external to the annulus region. One or more electrodes are further electrically connected to a first voltage potential to provide a first clamping force.

Claims

1. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:

a clamping plate having a clamping surface associated with the workpiece, wherein the clamping plate has a central region and an annulus region defined therein, and wherein the annulus region is generally disposed about a periphery of the central region;

a plurality of gas supply orifices defined in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices;

one or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas;

a seal disposed in the annulus region of the clamping plate, wherein the seal is configured to generally prevent a leakage of the cushion of gas from the central region to an environment external to the annulus region, and wherein the seal comprises one or more concentric differential pumping grooves defined in the clamping surface in the annulus region, wherein each of the one or more concentric differential pumping grooves are in fluid communication with one or more respective vacuum sources; and

one or more electrodes associated with at least the central region, wherein the one or more electrodes are electrically connected to a first voltage potential.

2. The electrostatic clamp of claim 1, wherein the central region of the clamping plate comprises a porous plate having a predetermined porosity associated therewith, wherein the predetermined porosity is defined by a ratio of a volume of voids to a volume of bulk material of the porous plate, and wherein the plurality of gas supply orifices are generally defined by the predetermined porosity of the porous plate.

3. The electrostatic clamp of claim 2, wherein the porous plate comprises one or more of a porous carbon and a porous silicon carbide material.

4. The electrostatic clamp of claim 3, wherein the porous plate comprises porous graphite.

5. The electrostatic clamp of claim 2, wherein the predetermined porosity of the porous plate ranges between approximately 5% and approximately 75%.

6. The electrostatic clamp of claim 1, wherein the plurality of gas supply orifices are distributed about the central region of the clamping plate in a generally uniform manner.

7. The electrostatic clamp of claim 1, wherein the plurality of gas supply orifices comprise one or more of a plurality of slits and a plurality of recessed rings defined in the central region of the clamping plate.

8. The electrostatic clamp of claim 1, wherein the wherein the plurality of gas supply orifices comprise a plurality of holes defined in the central region of the clamping plate.

9. The electrostatic clamp of claim 1, wherein the central region of the clamping plate is generally planar and void of any structure extending outwardly therefrom.

10. The electrostatic clamp of claim 1, wherein the clamping surface has a first plane associated with the annulus region, and a second plane associated with the central region, wherein the second plane is recessed from the first plane.

11. The electrostatic clamp of claim 10, wherein the seal comprises an elastomeric seal extending from the second plane to the first plane.

12. The electrostatic clamp of claim 10, wherein the second plane is recessed from the first plane by approximately 10 microns.

13. The electrostatic clamp of claim 1, comprising three concentric differential pumping grooves in fluid communication with three respective vacuum sources.

14. The electrostatic clamp of claim 1, wherein the one or more electrodes are further associated with the annulus region, wherein the one or more electrodes are electrically connected to a second voltage potential.

15. The electrostatic clamp of claim 1, wherein the one or more gas return orifices comprise one or more grooves in the clamping plate disposed between the central region and the seal.

16. The electrostatic clamp of claim 1, wherein the clamping plate further comprises two or more pins disposed about a periphery of the annulus region, wherein the two or more pins are configured to selectively interface with a periphery of the workpiece.

17. An electrostatic clamp for selectively maintaining a position of a workpiece, the electrostatic clamp comprising:

a clamping plate having a clamping surface associated with the workpiece, wherein the clamping plate has a central region and an annulus region defined therein, and wherein the annulus region is generally disposed about a periphery of the central region, and wherein the central region of the clamping plate comprises a porous plate having a predetermined porosity associated therewith, wherein the predetermined porosity is defined by a ratio of a volume of voids to a volume of bulk material of the porous plate and generally defines a plurality of gas supply orifices in the central region of the clamping plate, wherein the plurality of gas supply orifices are in fluid communication with a pressurized gas supply, and wherein the pressurized gas supply is configured to provide a cushion of gas between the clamping surface and the workpiece in the central region of the clamping plate via the plurality of gas supply orifices;

one or more gas return orifices defined in one or more of the central region and annulus region of the clamping plate, wherein the one or more gas return orifices are in fluid communication with a vacuum source, therein generally defining an exhaust path for the cushion of gas;

a seal disposed in the annulus region of the clamping plate, wherein the seal is configured to generally prevent a leakage of the cushion of gas from the central region to an environment external to the annulus region, and wherein the seal comprises one or more concentric differential pumping grooves defined in the clamping surface in the annulus region, wherein each of the one or more concentric differential pumping grooves are in fluid communication with one or more respective vacuum sources; and

one or more electrodes associated with at least the central region, wherein the one or more electrodes are electrically connected to a first voltage potential.

18. A method for clamping a workpiece, the method comprising:

providing a clamping plate, wherein the clamping plate comprises a central region and an annulus region having a seal defined therein, wherein a first electrode is associated with only the central region, and wherein the seal comprises one or more concentric differential pumping grooves is disposed in the annulus region of the clamping plate;

placing the workpiece over the clamping plate, wherein a peripheral region of the workpiece resides over the annulus region of the clamping plate;

providing a cushioning gas via a plurality of gas supply orifices defined in the central region of the clamping plate at a first gas pressure, wherein the cushioning gas generally repels the workpiece from the clamping plate with a first repelling force and provides a generally frictionless interface between the workpiece and at least the central region of the clamping plate;

applying a vacuum to each of the one or more concentric differential pumping grooves, therein generally preventing a leakage of the cushion of gas from the central region to an environment external to the annulus region;

applying a first voltage potential to the first electrode, therein generally attracting the workpiece to the clamping plate with a first attractive force, and wherein the workpiece is electrostatically attracted to the clamping plate only by the first attractive force; and

controlling the first gas pressure and first voltage potential, wherein the first repelling force and first attractive force are generally equalized.

19. The method of claim 18, wherein applying the first voltage potential to the first electrode generally provides a seal between the annulus region and the workpiece.